Details of a Researcher
Updated on 2024/12/21
Waseda University
Waseda University Graduate School, Division of Science and Engineering Electronic Engineering
Waseda University School of Science and Engineering
Waseda University Faculty of Science and Engineering Elctronics and Telecommunication
電気学会 医用・生体工学技術委員会1号委員
応用物理学会 プラズマエレクトロニクス研究会委員長
日本真空協会 編集委員
電子情報通信学会 エレクトロニクスグループ会計幹事
テレビジョン学会 編集委員会委員
IEEE(The Institute of Electrical and Electronics Engineers)
日本真空協会
テレビジョン学会
応用物理学会
電気学会
電子情報通信学会
The Vacuum Society of Japan
The Japan Society of Applied Physics
The Institute of Electrical Engineers
Information and Comunication Engineers
The Institute of Electronics
プラズマエレクトロニクス
プラズマ理工学
光子材料
光子工学
Plasma Electronics
Photonic Materials
Photonics
橘記念論文賞
1989
倉田奨励金
1985
a-Si:H膜成長中のイオン衝撃効果について(III)
磁界印加型同軸線路形MPCVD装置におけるH2/SiH4プラズマを用いたa-Si:H膜の作製
Effect of Ion Bombardment during a-Si : H Film Growth(III)
Fabrication of a-Si : H film Using H2-SiH4 Plasma in Magnetic Field Applied Coaxial Line Type MPCVD System
Fabrication of a-Si : H Film Using H2-SiH4 Plasma by Longitubinal Magnetic Field Applied MPCVD System
Si Luminescence Material Fabricated Using MDCVD Coaxial Line Type
Effect of Bombardment During a-Si : H Film Growth
二重管式同軸線路形MPCVD装置における水素プラズマへの磁界印加の効果(II)
a-Si:H膜成長中のイオン衝撃効果について(II)
2重管式同軸線路型MPCVDを用いて作製したSi系発光材料の研究(II)
エバネッセント波を用いた放電停止後の半導体極薄膜表面変化のその場観測
二重管式同軸線路形MPCVD装置における水素プラズマの磁界印加の効果
同軸線路形MPCVD装置において印加磁界がN2プラズマに及ぼす効果(IV)
2重管式同軸線路型MPCVDを用いて作製したSi系発生材料の研究
a-Si:H膜成長中のイオン衡撃効果について
Effect of Applying Magnetic Field to H2 Plasma in Double Tubed Coaxial Line Type MPCVD System(II)
Effect of Ion Bombardment during a-Si : H Film Growth(II)
The study of Si luminescence material fabricated using the double tubed coaxial line type MPCVD(II)
Effects of Applying Magnetic Field to H2 Plasma in Double Tubed Coaxial Line Type MPCVD System
The study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD
In situ Measurement of the Surface Change of Semiconductor Ultra Thin Films after Discharge Stop Using Evane cent Wave
Effect of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System(IV)
Effect of Ion Bombardment during a-Si : H Film Growth
同軸線路形MPCVD装置において印加磁界がN2プラズマに及ぼす効果(III)
同軸線路形マイクロ波プラズマ発生装置の基礎特性
同軸線路形マイクロ波プラズマのシュミレーション(III)
MPCVDにおけるa-Si:H膜質に与えるイオン衡撃の効果
縦磁界印加同軸線路形マイクロ波プラズマCVDによるSiN膜の作製
MPCVDにおけるa-Si:H膜のフォトルミネッセンス(II)
エバネッセント波を用いたリーク後の半導体極薄膜表面変化のその場観測
窒素ガス流量がSiN膜の膜特性に与える影響(II)
MPCVD法によって作製されたa-Si:H膜のフォトルミネッセンス
光ファイバーを用いた半導体極薄膜の光学的エネルギーギャップの測定
同軸線路形マイクロ波プラズマのシミュレーション(II)
同軸線路形MPCVD装置において印加磁界がArプラズマに及ぼす影響(IV)
同軸線路形MPCVD装置において印加磁界がN2プラズマに及ぼす効果(II)
無イオン衝撃作製のa-SI:H膜質の基板温度依存性
同軸線路形マイクロ波プラズマへの縦磁界印加の影響(II)
同軸線路形マイクロ波プラズマへの縦磁界印加の影響(III)
MPCVDにおける膜前面のシース電圧の制御と成膜
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System(III)
Characteristics of Coaxial Line Type Microwave H2 Plasma
Simulation of Coaxial Line Type Microwave Plasma(III)
Effect of Ion Bombardment on Film Properties of a-Si : H in MPCVD
Fabrication of SiN Film by Using Coaxial Line Type Microwave Plasma CVD System with Longitudinal Magnetic Field
Photoluminescence of a-Si : H films fabricated by MPCVD
In situ Measurement of the Surface Change of Semiconductor Ultra Thin Films after Leak Using Evanescent Wave
Influence of N2Gas Flow Rate on Film Properties of SiN Film(II)
Photoluminescence of a-Si : H films in MPCVD(II)
Optical Energy Gap Measurement of Semiconductor Ultra Thin Films Using Optical Fibers
Simulation of Coaxial-line type microwave plasma(II)
Influence of Applying Magnetic Field to Ar plasma in Coaxial Line Type MPCVD System
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System(II)
Dependence of Film Properties of a-Si : H fabricated without Ion Bombardment on Substrate Temperature
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type microwave Plasma(II)
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type microwave Plasma(III)
Film Deposition under Control of Sheath Voltage on the Film Surface in MPCVD Apparatus
同軸線路形マイクロ波プラズマのシミュレーション
同軸線路形MPCVD装置において印加磁界がN2プラズマに及ぼす効果
同軸線路形MPCVD装置において印加磁界がArプラズマに及ぼす影響(III)
MPCVDにおけるイオン衝撃エネルギーの制御
マイクロ波プラズマにおけるRFバイアス印加効果
2重管式同軸線路型MPCVDによるa-Si:H膜の長波長帯における屈折率測定
光導波路を用いたa-Si:H薄膜の赤外吸収スペクトル測定
縦方向磁界印加MPCVD装置によるSiN膜の作製
平板光導波路を用いたMPCVD薄膜の屈折率測定
内管の電位がプラズマパラメータと膜質に与える影響
同軸線路形マイクロ波プラズマへの縦磁界印加の影響
RFバイアス印加同軸線路形MPCVDによるSiN膜の作製
MPCVDにおける内管の電位が膜質に与える影響
スラブ光導波路を用いた装荷薄膜の屈折率測定
半導体膜装荷時の光導波路における透過率の装荷膜厚依存性
同軸線路形MPCVD装置において印加磁界がArプラズマに及ぼす影響
Simulation of Coaxial-line type microwave plasma
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System
Influence of Applying Magnetic Field to Ar plasma in Coaxial Line Type MPCVD System (III)
Control of Ion Bombardment Energy in Mpcvd
Effects of Rf Bias on Microwave Plasma
Refractive indices of a-Si : H films by double-tubed coaxial-line type MPCVD at long wave length region
Measurement of infrared absorption spectrum in thin a-SiH films using an optical waveguide
Fabrication of SiN Film by Using MPCVD System with Longitudinal Magnetic Field
Refractive Index Measurement of MPCVD Thin Films Using Slab Wave Guide
Dependence of Plasma Parameters and Film Properties on Electric Potential of Inner Tube
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave Plasma
Fabrication of SiN Films by Using RF Biased Coaxial Line Type MPCVD
Dependence of Film Properties on Electric Potential of Inner Tube in MPCVD
Refrective Index Measurement of Fabricated Thin Films Using Slab Waveguide
Dependence of Transmittance of Waveguids on Fabricated Films during Fabrication of Semiconductor Films
Influences of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System (II)
平板光導波路を用いた薄膜の屈折率の測定
半導体薄膜装荷平板光導波路における透過率の振動の解析
平板光導波路を用いた半導体極薄膜の光学エネルギーギャップの測定(III)
縦方向磁界印加MPCVD装置によるα-SiH膜の作製
MPCVDにおけるα-Si:H膜の膜質の基板温度依存性
窒素ガス流量がSiN膜の膜特性に与える影響
二重管式同軸線路形マイクロ波プラズマCVDにおけるSiN膜の膜質の内管端位置依存性
同軸線路形MPCVD装置において印加磁界がArプラズマに及ぼす影響
Optical Energy Gap Measurement of Semiconductor Ultra Thin Films Using a Slab Waveguide (III)
Fabrication of a-Si : H Film by MPCVD System with Longitudinal Magnetic Field
Dependence of the Film Properties of A-Si : H on Substrate Temperature in MPCVD
Removal Condition of Films Deposited on Probe
Refractive Index Measurement of Thin Films Using a Slab Waveguide
Analysys of Oscillation of Transmittance on Slab Waveguide with Semiconductor Thin Films
Optical Energy Gap Measurement of Semiconductor Films using an Optical Waveguide
Fabrication of SiN Films on Magnetic Tape For Protective Film by Coaxial Line Type MPCVD System
High Rate Deposition of a-SiiH Films by Coaxial Line Type MPCVD System
Ingluence of N2 Gas Flow Rate on Film Properties of SiN Film
Dependence of Properties of SiN Film on End Position of Inner Tube in Double Tube Coaxial Line Type MPCVD System
Influences of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System
Ion Bomberement Effect Under MPCVD of a-SiiH Film
Optical Energy Gap Measurement of Plasma CVD Thin Films Using The Evanescent Wave
Control of Ion Bombardment Energy in Coaxial Line Type Microwave Plasma CVD System
Spatial Distribution of Space Potential in Chamber of Coaxial Line Type Microwave Plasma CVD
Probe Measurement in N2/SiH4 Microwave Plasma
マイクロ波プラズマCVDにおけるプラズマパラメータ
RRバイアス法によるイオン衝撃の制御
RRバイアス印加マイクロ波プラズマCVD法によるSiN膜の低温作製
マイクロ波放電を用いたプラズマ化学気相推積法
同軸線路型マイクロ波プラズマCVDにおけるプラズマパラメータ
Effect of DC Bias on a-si : H Films Fabricated by using Double Coaxial Line Type Microwave Plasma CVD System
TEOSガスを用いて作製したSi系薄膜のPL発光強度とその組成依存性
第60回応用物理学会関係連合講演会
Presentation date： 2013
空気を用いた空間的アフターグロープラズマ滅菌におけるラジカル種と紫外線の殺菌効果の比較
第60回応用物理学会関係連合講演会
Presentation date： 2013
TEOSで作製したa-Si膜のPL発光特性のマイクロ波電力依存性
第73回応用物理学会学術講演会講演
Presentation date： 2012
光計測
光子材料の作製
プラズマエレクトロニクス
光導波路を用いた極薄膜の計測法
マイクロ波プラズマCVD
Plasma Electronics
Measurement Method of Super thin Film by Light Wave Guide
Microwave Plasma CVD
空気を用いた空間的アフターグロープラズマによる低温高速減菌
田端究, 神山貴洋, 加藤勇
第59回応用物理学会関係連合講演会 講演予稿集 17a-A7-20 040-040 2012
a-SiN薄膜の製膜条件を変化させる事によるPL発光強度への影響
梶山裕, 船津友希, 加藤勇
第59回応用物理学会関係連合講演会 講演予稿集 16a-A6-10 010-010 2012
TEOSで作製したa-Si:H/SiN多層膜光導波路の消光比特性
大野拓, 杉山裕太, 田丸直幸, 加藤勇
第59回応用物理学会関係連合講演会 講演予稿集 18a-GP4-17 126 - 126 2012
Photoluminescence Characteristics of Amorphous Si Film Fabricated from TEOS Gas and Nitrogen Plasma
Tomoki Funatsu, Yutaka Kajiyama, Isamu Kato
ADVANCES IN APPLIED PLASMA SCIENCE Vol.8 ( 11 ) 173 - 174 2011
マイクロ波プラズマCVD法によりTEOSで作製したSi薄膜からの発光特性
船津友希, 梶山裕, 加藤勇
第72回応用物理学会学術講演会講演予稿集 31p-P6-5 ( 14 ) 177 - 177 2011
TEOSを用いて作成した膜のPL発光特性の酸化温度依存性
長谷川裕也, 東山晃平, 加藤勇
第72回応用物理学会学術講演会 講演予稿集 1a-ZC-4 ( 8 ) 44 - 44 2011
a-Si:H/SiN多層膜の膜厚比変化による光導波路の消光比特性
千葉弘明, 大野拓, 田丸直幸, 加藤勇
第58回春季応用物理学会学術講演会講演予稿集 24a-KB-13 ( 05 ) 079 2011
a-Si:Hナノボール膜からのPL発光特性の放電時間依存性
斉藤裕介, 長谷川裕也, 加藤勇
第58回春季応用物理学会学術講演会講演予稿集 26a-BW-4 ( 14 ) 210 2011
大気中での酸化を防いだa-SiNHナノボール膜からの発光特性
須藤邦海, 船津友希, 加藤勇
第58回春季応用物理学会学術講演会講演予稿集 26a-BW-5 ( 14 ) 211 2011
Photoluminescence Characteristics of Amorphous Si Film Fabricated from TEOS Gas and Nitrogen Plasma
Tomoki Funatsu, Yutaka Kajiyama, Isamu Kato
ADVANCES IN APPLIED PLASMA SCIENCE Vol.8 ( 11 ) 173 - 174 2011
a-Si:H/SiN多層膜光導波路のコア部膜厚比依存性
千葉弘明, 大野拓, 田丸直幸, 加藤勇
第71回応用物理学会学術講演会講演予稿集 16p-G-19 ( 05 ) 108 2010
a-Si:Hナノボール膜からのPL発光特性の製膜時基板位置依存性
斉藤裕介, 長谷川裕也, 加藤勇
第71回応用物理学会学術講演会講演予稿集 17a-NB-5 ( 14 ) 247 2010
a-Si:H/SiN多層膜光導波路のa-Si:H幕厚依存性
千葉弘明, 田丸直幸, 加藤勇
第57回春季応用物理学会学術講演会講演予稿集 17p-P3-4 ( 05 ) 57 2010
a-SiNHナノボール膜からのPL発光の製膜時基板温度依存性
吉田樹, 須藤邦海, 加藤勇
第57回春季応用物理学会学術講演会講演予稿集 20a-TE-10 ( 14 ) 246 2010
a-Si:Hナノボール膜からのPL発光特性のアニール温度依存性
斉藤裕介, 加藤
第57回春季応用物理学会学術講演会講演予稿集 20a-TE-9 ( 14 ) 245 2010
The Characteristics of Mode Filtering of a-Si:H/SiN Multilayer film Optical Waveguide
Hiroaki Chiba, Naoyuki Tamaru, Isamu Kato
第27回プラズマプロセッシング研究会プロシーディングス P2-52 327 - 328 2010
Photoluminescence of Si nanocrystals fabricated by N2 gas plasma
Tarsuki Yosida, Kunimi Suto, Isamu Kato
第27回プラズマプロセッシング研究会プロシーディングス P2-51 325 - 326 2010
a-Si:Hナノボール膜からのPL発光特性の製膜時基板位置依存性
斉藤裕介, 長谷川裕也, 加藤勇
第71回応用物理学会学術講演会講演予稿集 17a-NB-5 ( 14 ) 247 2010
The Characteristics of Mode Filtering of a-Si:H/SiN Multilayer film Optical Waveguide
Hiroaki Chiba, Naoyuki Tamaru, Isamu Kato
第27回プラズマプロセッシング研究会プロシーディングス P2-52 327 - 328 2010
Photoluminescence of Si nanocrystals fabricated by N2 gas plasma
Tarsuki Yosida, Kunimi Suto, Isamu Kato
第27回プラズマプロセッシング研究会プロシーディングス P2-51 325 - 326 2010
Annealing effect on photoluminescence characteristics of a-Si:H nanoball-films
vol.17 ( 1 ) 67 - 72 2009
光ポンピングによるa-Si:H/SiN多層膜を応用した光導波路の偏光特性
千葉弘明, 坂本元, 田丸直幸, 加藤勇
第70回応用物理学会学術講演会講演予稿集 10a-ZN-1 2009
窒素プラズマで作製したa-SiNHナノボール膜の熱窒化後のフォトルミネッセンス (Ⅱ)
吉田樹, 吉田慎吾, 坂本元, 加藤勇
第５６回応用物理学関係連合講演会講演予稿集 30a-P4-3 2009
Photoluminescence Characteristics of Annealed a-Si:H Nanoball-Films by N2 Gas
冨海勝, 斉藤裕介, 坂本元, 加藤勇
第２６回プラズマプロセッシング研究会プロシーディングス P3-15 2009
Photoluminescence of a-SiNH nanoball films fabricated by N2 gas plasma after thermal nitridation
吉田慎吾, 吉田樹, 坂本元, 加藤勇
第２６回プラズマプロセッシング研究会プロシーディングス P2-27 2009
窒素プラズマで作製したa-SiNHナノボール膜の熱窒化後のフォトルミネッセンス特性
吉田慎吾, 吉田樹, 坂本元, 加藤勇
第６９回応用物理学会学術講演会講演予稿集 4a-S-2 2008
a-Si:Hナノボール膜からのPL発光スペクトルにおけるアニール処理効果[Ⅱ]
冨海勝, 斉藤裕介, 坂本元, 加藤勇
第６９回応用物理学会学術講演会講演予稿集 4p-ZF-11 2008
Annealing Effect on PL Characteristics of the Oxidized a-si:H Nanoball-Films
Makoto Onodera, Masaru Tonomi, Hajime Sakamoto, Isamu Kato
Frontier of Applied Plasma Technology vol.1 87 - 88 2008
窒素プラズマを用いて作製したa-SiNHナノボール膜の熱窒化処理
吉田慎吾, 坂本元, 加藤勇
第５５回応用物理学関係連合講演会講演予稿集 27p-S-8 2008
a-Si:Hナノボール膜からのPL発光スペクトルにおけるアニール処理効果
小野寺誠, 冨海勝, 坂本元, 加藤勇
第５５回応用物理学関係連合講演会講演予稿集 29p-ZD-12 2008
Annealing Effect on PL Characteristics of the Oxidized a-Si:H Nanoball-Films
Makoto ONODERA, Masaru TONOMI, Hajime SAKAMOTO, Isamu KAto
IAPS Frontier of Applied Plasma Technology p87-88 2008
Photoluminescence characteristics of a-SiNH nanoball films fabricated by N2 gas plasma using MPCVD System
中村元彦, 吉田慎吾, 坂本元, 加藤勇
第２５回プラズマプロセシング研究会プロシーディングス p59-60 2008
Photoluminescence Characteristics of a-Ai:H Nanoball-films Fabricated Using H2 Plasma by Annealing Treatment
小野寺誠, 冨海勝, 坂本元, 加藤勇
第２５回プラズマプロセシング研究会プロシーディングス p61-62 2008
Characteristics of photoluminescence from a-Si:H nanoball-films fabricated in spatial after glow plasmas
立花大志, 坂本元, 加藤勇
第２５回プラズマプロセシング研究会プロシーディングス p263-264 2008
Annealing Effect on PL Characteristics of the Oxidized a-si:H Nanoball-Films
Makoto Onodera, Masaru Tonomi, Hajime Sakamoto, Isamu Kato
Frontier of Applied Plasma Technology vol.1 87 - 88 2008
Annealing Effect on PL Characteristics of the Oxidized a-Si:H Nanoball-Films
Makoto ONODERA, Masaru TONOMI, Hajime SAKAMOTO, Isamu KAto
IAPS Frontier of Applied Plasma Technology p87-88 2008
a-Si:H/SiN Mutilayer Waveguide Polarization Characteristics By Applying Pumping Light
Mohd Saiful Dzukefly Bin, Zan,Mohammad, Syuhaimi Ab-Rahman, Huda Abdullah, Isamu Kato
RSM 2007 Proc.2007 2007
窒素プラズマを用いて作製したa-SiNHナノボール膜のPL発光特性
中村元彦, 坂本元, 加藤勇
第６８回応用物理学会学術講演会講演予稿集 6a-L-7 2007
空間的アフターグロープラズマにおけるa-Si:Hナノボール膜のPL発光特性
立花大志, 坂本元, 加藤勇
第６８回応用物理学会学術講演講演予稿集 6a-L-8 2007
Photoluminescence from Si Nanocrystals in a-Si:H Nanoball-Films Fabricated in Spatial After Glow Plasmas
Taishi TACHIBANA, Hajime SAKAMOTO, Isamu KATO
ADVANCES IN APPLIED PLASMA SCIENCE,Vol.6 p1-2 2007
A Change in Intensity of Photoluminescence from a-Si:H Nanoball-Films Fabricated Using Hydrogen Plasma
Makoto Onodera, Keisuke Miyakawa, Hajime Sakamoto, Isamu Kato
ADVANCES IN APPLIED PLASMA SCIENCE.Vol.6 p263-264 2007
水素プラズマを用いて作製したa-Si:Hナノボール膜からのPL発光波長の長波長化
真田宏, 宮川圭介, 小野寺誠, 坂本元, 加藤勇
第５４回応用物理学会学術講演会講演予稿集 28p-ZK-6 2007
光ポンピングによるa-Si:H/SiN多層膜スラブ型光導波路の消光比の変化
服部元洋, 村越謙一, 坂本元, 田丸直幸, 加藤勇
第５４回応用物理学会学術講演会講演予稿集 28a-ZS-6 2007
イオン衝撃エネルギーの増加によるa-Si:Hナノボール膜への影響
真田宏, 小野寺誠, 宮川圭介, 坂本元, 加藤勇
第５４回応用物理学会学術講演会講演予稿集 27p-G-10 2007
Wavekength changing of Photoluminescence from a-Si:H nanoball films fabricated using Hydrogen Plasma
真田宏, 小野寺誠, 宮川圭介, 坂本元, 加藤勇
第2４回プラズマプロセッシング研究会プロシーディングス P1-35 2007
The Characteristics of Polarization of a-Si:H/SiN Multilayers Optical Waveguide by Optical Pumping
服部元洋, 村越謙一, 坂本元, 田丸直幸, 加藤勇
第2４回プラズマプロセッシング研究会プロシーディングス P2-65 2007
a-Si:H/SiN Mutilayer Waveguide Polarization Characteristics By Applying Pumping Light
Mohd Saiful Dzukefly Bin, Zan,Mohammad, Syuhaimi Ab-Rahman, Huda Abdullah, Isamu Kato
RSM 2007 Proc.2007 2007
水素プラズマを用いて作成したa-Si:Hナノボール膜からのPL発光強度の増加
真田宏, 宮川圭介, 坂本元, 加藤勇
第67回応用物理学会学術講演会講演予稿集 la-P15-25 2006
水素プラズマを用いて作成したa-Si:Hナノボール膜からのPL発光のブルーシフト
西本泰, 真田宏, 坂本元, 加藤勇
第53回応用物理学関係連合講演会講演予稿集 25p-ZH-11 2006
N2プラズマによって作成されたa-Si:Hナノボール膜からのPL発光
金本悠平, 小柴吉雄, 坂本元, 加藤勇
第53回応用物理学関係連合講演会講演予稿集 26p-ZC-4 2006
Photoluminescence from a-Si:H nanoball film fabricated by Hydrogen Plasma
西本泰, 真田宏, 金本悠平, 小柴吉雄, 坂本元, 加藤勇
第23回プラズマプロセッシング研究会プロシーディングス P-2B-03 2006
Blue Shift of Photoluminescence from Si Nanocrystal
金本悠平, 小柴吉雄, 西本泰, 真田宏, 坂本元, 加藤勇
第23回プラズマプロセッシング研究会プロシーディングス P-3A-23 2006
放電ガスをH2として作製したa-Si:Hナノボール膜からのPL発光ブルーシフト
西本泰, 真田宏, 加藤勇
第66回応用物理学関係連合講演会 講演予稿集 10a-ZH-5 2005
マイクロ波CVDにより作製したa-Si:Hナノボール膜のPL発光波長の短波長化
金本悠平, 小柴吉雄, 加藤
第66回応用物理学関係連合講演会 講演予稿集 9p-K-7 2005
a-Si:Hナノボール膜のPL発光波長とSiナノクリスタルサイズの関係
西本泰, 真田宏, 加藤勇
第66回応用物理学関係連合講演会 講演予稿集 10a-ZH-6 2005
Arプラズマを用いて作製したSiナノクリスタルからの発光特性
金本悠平, 小柴吉雄, 加藤
第66回応用物理学関係連合講演会 講演予稿集 9p-K-8 2005
導波型TE/TMモードフィルタの特性
佐藤史門, 相川亮桂, 加藤勇
第52回応用物理学関係連合講演会 講演予稿集 29a-ZQ-4 2005
a-Si:Hナノボール膜の膜質および発光特性の研究
鈴木文明, 金本悠平, 小柴吉雄, 加藤勇
第52回応用物理学関係連合講演会 講演予稿集 31a-YH-6 2005
SiナノクリスタルからのPL発光のスペクトル特性
金本悠平, 鈴木文明, 吉田周平, 加藤勇
第52回応用物理学関係連合講演会 講演予稿集 31a-YH-5 2005
ArプラズマおよびH2プラズマを用いて作成したa-Si:Hナノボール膜の膜質と発光特性Ⅱ
吉田周平, 加藤聖史, 真田宏, 加藤勇
第52回応用物理学関係連合講演会 講演予稿集 30a-D-4 2005
The Characteristic of TE/TM mode filter with Optical Waveguide
Shimon Sato, Ryokei Aikawa, Isamu Kato
Extended Abstracts(The 52th Spring Meeting, 2005) ; The Japan Society of Applied Physics and Related Societies 29a-ZQ-4 2005
Research of Properties and photoluminescence characteristics of a-Si:H nanoball films
Fumiaki Suzuki, Yuhei Kanemoto, Yoshio Koshiba and, Isamu Kato
Extended Abstracts(The 52th Spring Meeting, 2005) ; The Japan Society of Applied Physics and Related Societies 31a-YH-6 2005
Film properties and PL characteristics of Hydrogenated Amorphous Silicon Nanoball Films by using Ar or H2 plasma 2
Syuhei Yoshida, Masashi Kato, Hiroshi Sanada, Isamu Kato
Extended Abstracts(The 52th Spring Meeting, 2005) ; The Japan Society of Applied Physics and Related Societies 30a-D-4 2005
Characteristic of photoluminescence spectra from Si Nanocrystals
Yuhei Kanemoto, Fumiaki Suzuki, Syuhei Yoshida and, Isamu Kato
Extended Abstracts(The 52th Spring Meeting, 2005) ; The Japan Society of Applied Physics and Related Societies 31a-YH-5 2005
High-intensity Photoluminescence from Hydrogenated Amorphous Silicon Nanoball Films Fabricated using Hydrogen-plasma
吉田周平, 加藤聖史, 加藤勇
第22回プラズマプロセッシング研究会プロシーディングス P1-065 2005
Film properties and Photolumines Characteristics Of Double-layered a-Si:H Nanoball Films
鈴木文明, 金本悠平, 加藤勇
第22回プラズマプロセッシング研究会プロシーディングス P1-59 2005
High-intensity Photoluminescence from Hydrogenated Amorphous Silicon Nanoball Films Fabricated using Hydrogen-plasma
Syuhei Yoshida, Masashi Kato, Isamu Kato
Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing P1-065 2005
Film properties and Photolumines Characteristics Of Double-layered a-Si:H Nanoball Films
Fumiaki Suzuki, Yuhei Kanemoto, Isamu Kato
Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing P1-59 2005
The Characteristic of TE/TM mode filter with Optical Waveguide
Shimon Sato, Ryokei Aikawa, Isamu Kato
Extended Abstracts(The 52th Spring Meeting, 2005) ; The Japan Society of Applied Physics and Related Societies 29a-ZQ-4 2005
Research of Properties and photoluminescence characteristics of a-Si:H nanoball films
Fumiaki Suzuki, Yuhei Kanemoto, Yoshio Koshiba and, Isamu Kato
Extended Abstracts(The 52th Spring Meeting, 2005) ; The Japan Society of Applied Physics and Related Societies 31a-YH-6 2005
Film properties and PL characteristics of Hydrogenated Amorphous Silicon Nanoball Films by using Ar or H2 plasma 2
Syuhei Yoshida, Masashi Kato, Hiroshi Sanada, Isamu Kato
Extended Abstracts(The 52th Spring Meeting, 2005) ; The Japan Society of Applied Physics and Related Societies 30a-D-4 2005
Characteristic of photoluminescence spectra from Si Nanocrystals
Yuhei Kanemoto, Fumiaki Suzuki, Syuhei Yoshida and, Isamu Kato
Extended Abstracts(The 52th Spring Meeting, 2005) ; The Japan Society of Applied Physics and Related Societies 31a-YH-5 2005
High-intensity Photoluminescence from Hydrogenated Amorphous Silicon Nanoball Films Fabricated using Hydrogen-plasma
Syuhei Yoshida, Masashi Kato, Isamu Kato
Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing P1-065 2005
Film properties and Photolumines Characteristics Of Double-layered a-Si:H Nanoball Films
Fumiaki Suzuki, Yuhei Kanemoto, Isamu Kato
Plasma Science Symposium 2005/The 22nd Symposium on Plasma Processing P1-59 2005
Effect of HF treatment on photoluminescence characteristics of a-Si : H nanoball films
Y Motoyama, F Suzuki, Kato, I
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 43 ( 11A ) 7542 - 7543 2004.11
DTCL-MPCVD装置を用いて作成したa-Si:Hナノボール膜の構造および成長機構のモデル化
鈴木文明, 金本悠平, 加藤勇
第65回応用物理学関係連合講演会 講演予稿集 1p-ZL-12 2004
DTCL-MPCVD装置を用いたSi基板上のカーボンナノチューブにおける間隔の制御
中村尚裕, 千綿理人, 加藤勇, 宇高勝之, 中野孝俊
第65回応用物理学関係連合講演会 講演予稿集 2p-Q-5 2004
ArプラズマおよびH2プラズマを用いて作成したa-Si:Hナノボール膜の膜質と発光特性
吉田周平, 加藤聖史, 加藤勇
第65回応用物理学関係連合講演会 講演予稿集 3a-S-1 2004
The control of rhe distance about carbon nanotubes on the Si substrate fabricated by DTCL-MPCVD system
Naohiro Nakamura, Masato Chiwata, Isamu Kato, Katsuyuki Utaka, Takatoshi Nakano
Extended Abstracts(The 65th Autumn Meeting, 2004) ; The Japan Society of Applied Physics 2p-Q-5 2004
Modeling of structure and growing mechanism of a-Si:H nanoball films fabricated by DTCL-MPCVD system
Fumiaki Suzuki, Yuhei Kanemoto and, Isamu Kato
Extended Abstracts(The 65th Autumn Meeting, 2004) ; The Japan Society of Applied Physics 1p-ZL-12 2004
Film properties and PL characteristics of Hydrogenated Amorphous Silicon nanoball dilms using by Ar orH2 Plasma
Syuhei Yoshida, Masashi Kato, Isamu Kato
Extended Abstracts(The 65th Autumn Meeting, 2004) ; The Japan Society of Applied Physics 3a-S-1 2004
水素プラズマを用いて作成したa-Si:Hナノボール膜の膜質と発光特性
吉田周平, 加藤勇
第51回応用物理学関係連合講演会 講演予稿集 28p-P6-5 2004
DTCL-MPCVD装置を用いて石英基板上に作成したa-Si:Hナノボール膜のPL発光特性
鈴木文明, 元山陽介, 加藤勇
第51回応用物理学関係連合講演会 講演予稿集 28p-P6-6 2004
DTCL-MPCVD装置によるナノ周期でパターニング処理を行ったSi基板上でのカーボンナノチューブの作製
千綿理人, 会田太, 加藤勇, 宇高勝之, 中岡宏
第51回応用物理学関係連合講演会 講演予稿集 30a-ZX-1 2004
PL charaxteristic of a-Si:H nanoball dilms on SiO2 substrates fabricated by DTCL-MPCVD system
Fumiaki Suzuki, Yosuke Motoyama and, Isamu Kato
Extended Abstracts(The 51th Spring Meeting, 2004) ; The Japan Society of Applied Physics and Related Societies 28p-P6-6 2004
Film properties and PL characteristies of Hydrogenated Amorphous Silicon nanoball films fabricated using hydrogen plasma
Syuhei Yoshida, Isamu Kato
Extended Abstracts(The 51th Spring Meeting, 2004) ; The Japan Society of Applied Physics and Related Societies 28p-P6-5 2004
Fabrication of carbon nanotubes by DTCL-MPCVD on Si nano-pariodically patterned substrate
Masato Chiwata, Futoshi Aida, Isamu Kato, Katsuyuki Utaka, Hiroshi Nakaoka
Extended Abstracts(The 51th Spring Meeting, 2004) ; The Japan Society of Applied Physics and Related Societies 30a-ZX-1 2004
PL characteristics of Hydrogenated Amorphous Silicon Nanoball Films performed high temperature Oxidation processing in pure oxygen
元山陽介, 鈴木文明, 加藤勇, 鈴木恒則, 小栗和也
第21回プラズマプロセッシング研究会プロシーディングス P2-15 2004
Film properties and PL characteristics of Hydrogenated Amorphous Silicon Nanoball Films Fabricated using Hydrogen-plasma
吉田周平, 元山陽介, 加藤勇
第21回プラズマプロセッシング研究会プロシーディングス P2-14 2004
Fabrication of carbon nanotubes by DTCL-MPCVD with Pt Catalyst on Si nano-pariodically patterned substrate
会田太, 千綿理人, 加藤勇, 宇高勝之, 中岡宏
第21回プラズマプロセッシング研究会プロシーディングス P2-21 2004
Effect of HF treatment on Photoluminescence Characteristics of a-Si:H nanoball films fabricated by DTCL-MPCVD system
鈴木文明, 元山陽介, 加藤勇, 鈴木恒則, 小栗和也
第21回プラズマプロセッシング研究会プロシーディングス P2-16 2004
PL characteristics of Hydrogenated Amorphous Silicon Nanoball Films performed high temperature Oxidation processing in pure oxygen
Fumiaki Suzuki, Yosuke Motoyama, Isamu Kato, Tsunenori Suzuki, Kazuya Oguri
Plasma Science Symposium 2004/The 21nd Symposium on Plasma Processing P2-15 2004
Film properties and PL characteristics of Hydrogenated Amorphous Silicon Nanoball Films Fabricated using Hydrogen-plasma
Syuhei Yoshida, Yosuke Motoyama, Isamu Kato
Plasma Science Symposium 2004/The 21nd Symposium on Plasma Processing P2-14 2004
Fabrication of carbon nanotubes by DTCL-MPCVD with Pt Catalyst on Si nano-pariodically patterned substrate
Masato Chiwata, Futoshi Aida, Isamu Kato, Katsuyuki Utaka, Hiroshi Nakaoka
Plasma Science Symposium 2004/The 21nd Symposium on Plasma Processing P2-21 2004
Effect of HF treatment on Photoluminescence Characteristics of a-Si:H nanoball films fabricated by DTCL-MPCVD system
Fumiaki Suzuki, Yosuke Motoyama, Isamu Kato, Tsunenori Suzuki, Kazuya Oguri
Plasma Science Symposium 2004/The 21nd Symposium on Plasma Processing P2-16 2004
The control of rhe distance about carbon nanotubes on the Si substrate fabricated by DTCL-MPCVD system
Naohiro Nakamura, Masato Chiwata, Isamu Kato, Katsuyuki Utaka, Takatoshi Nakano
Extended Abstracts(The 65th Autumn Meeting, 2004) ; The Japan Society of Applied Physics 2p-Q-5 2004
Modeling of structure and growing mechanism of a-Si:H nanoball films fabricated by DTCL-MPCVD system
Fumiaki Suzuki, Yuhei Kanemoto and, Isamu Kato
Extended Abstracts(The 65th Autumn Meeting, 2004) ; The Japan Society of Applied Physics 1p-ZL-12 2004
Film properties and PL characteristics of Hydrogenated Amorphous Silicon nanoball dilms using by Ar orH2 Plasma
Syuhei Yoshida, Masashi Kato, Isamu Kato
Extended Abstracts(The 65th Autumn Meeting, 2004) ; The Japan Society of Applied Physics 3a-S-1 2004
Film properties and photoluminescence characteristics of hydrogenated amorphous silicon nanoball films fabricated using Ar/H2 mixture gas plasma
Yosuke Motoyama, Isamu Kato, Ryouhei Saito
Shinku/Journal of the Vacuum Society of Japan 47 ( 8 ) 644 - 651 2004
PL charaxteristic of a-Si:H nanoball dilms on SiO2 substrates fabricated by DTCL-MPCVD system
Fumiaki Suzuki, Yosuke Motoyama and, Isamu Kato
Extended Abstracts(The 51th Spring Meeting, 2004) ; The Japan Society of Applied Physics and Related Societies 28p-P6-6 2004
Film properties and PL characteristies of Hydrogenated Amorphous Silicon nanoball films fabricated using hydrogen plasma
Syuhei Yoshida, Isamu Kato
Extended Abstracts(The 51th Spring Meeting, 2004) ; The Japan Society of Applied Physics and Related Societies 28p-P6-5 2004
Fabrication of carbon nanotubes by DTCL-MPCVD on Si nano-pariodically patterned substrate
Masato Chiwata, Futoshi Aida, Isamu Kato, Katsuyuki Utaka, Hiroshi Nakaoka
Extended Abstracts(The 51th Spring Meeting, 2004) ; The Japan Society of Applied Physics and Related Societies 30a-ZX-1 2004
PL characteristics of Hydrogenated Amorphous Silicon Nanoball Films performed high temperature Oxidation processing in pure oxygen
Fumiaki Suzuki, Yosuke Motoyama, Isamu Kato, Tsunenori Suzuki, Kazuya Oguri
Plasma Science Symposium 2004/The 21nd Symposium on Plasma Processing P2-15 2004
Film properties and PL characteristics of Hydrogenated Amorphous Silicon Nanoball Films Fabricated using Hydrogen-plasma
Syuhei Yoshida, Yosuke Motoyama, Isamu Kato
Plasma Science Symposium 2004/The 21nd Symposium on Plasma Processing P2-14 2004
Fabrication of carbon nanotubes by DTCL-MPCVD with Pt Catalyst on Si nano-pariodically patterned substrate
Masato Chiwata, Futoshi Aida, Isamu Kato, Katsuyuki Utaka, Hiroshi Nakaoka
Plasma Science Symposium 2004/The 21nd Symposium on Plasma Processing P2-21 2004
Effect of HF treatment on Photoluminescence Characteristics of a-Si:H nanoball films fabricated by DTCL-MPCVD system
Fumiaki Suzuki, Yosuke Motoyama, Isamu Kato, Tsunenori Suzuki, Kazuya Oguri
Plasma Science Symposium 2004/The 21nd Symposium on Plasma Processing P2-16 2004
PDCL-MPCVD法により作製したa-Si:Hナノボール膜からのＰＬ発光のブルーシフト（Ⅱ）
元山陽介, 鈴木文明, 加藤勇, 鈴木恒則, 小栗和也
第64回応用物理学関係連合講演会 講演予稿集 30p/ZE, 5 2003
PDCL-MPCVD法により作製したa-Si:Hナノボール膜からのＰＬ発光のブルーシフト（Ⅰ）
鈴木文明, 元山陽介, 加藤勇, 鈴木恒則, 小栗和也
第64回応用物理学関係連合講演会 講演予稿集 30p/ZE, 2 2003
DTCL-MPCVD装置によるSiNナノボール膜の作製とPL発光特性
吉田周平, 加藤勇
第64回応用物理学関係連合講演会 講演予稿集 1a/ZG, 3 2003
DTCL-MPCVD装置により水素プラズマを用いて作成したa-Si:Hナノボール膜からのPL発光特性
吉田周平, 加藤勇
第64回応用物理学関係連合講演会 講演予稿集 30p/ZE, 3 2003
PL characteristics from a-Si:H nanoball films fabricated using Hydrogen Plasma by DTCL-MPVD
Syuhei Yoshida, Isamu Kato
Extended Abstracts (The 64th Autumn Meeting 2003): The Japan Society of Applied Physics 30p/ZE, 3 2003
Fabrication of SiN nanoball films by DTCL-MPVD System and their PL Characteristics
Syuhei Yoshida, Isamu Kato
Extended Abstracts (The 64th Autumn Meeting 2003): The Japan Society of Applied Physics 1a/ZG, 3 2003
Blueshift of Photo luminescense from a-Si:H nanoball films fabricated by DTCL-MPCVD(Ⅱ)
Fumiaki Suzuki, Yosuke Motoyama, Isamu Kato, Tsunenori Suzuki, Kazuya Oguri
Extended Abstracts (The 64th Autumn Meeting 2003): The Japan Society of Applied Physics 30p/ZE, 5 2003
Blueshift of Photo luminescense from a-Si:H nanoball films fabricated by DTCL-MPCVD(Ⅰ)
Yosuke Motoyama, Fumiaki Suzuki, Isamu Kato, Tsunenori Suzuki, Kazuya Oguri
Extended Abstracts (The 64th Autumn Meeting 2003): The Japan Society of Applied Physics 30p/ZE, 4 2003
Charactarization of New Driving Systems for a Electromagnetic Tuning Fork Using a Wave Generator
Hiroshi Kezuka, Mitsuhiro Kudo, Norimasa Honda, Tsunenori Suzuki, Isamu Kato
International Conference on Electrical Engineering 2004 2003
PDCL-MPCVD法により作製したa-Si:Hナノボール膜からのＰＬ発光特性（2）
元山陽介, 斉藤良平, 加藤勇, 毛塚博史, 鈴木恒則
第50回応用物理学関係連合講演会 講演予稿集 28p/ZF, 2 2003
EVATUATION METHOD OF FLUORESCENCE MULTI-PHOTON COUNTING
Hiroshi ASAI, Toru ASAHI, Isamu KATO
The 47th Annual Meeting Of Biophysical society 2003
DTCL-MPCVD法を用いたナノ構造を持つ光導波路の作製とその特性（Ⅱ）
大島正資, 篠原正仁, 田丸直幸, 加藤勇
第50回応用物理学関係連合講演会 講演予稿集 28a/Zk, 4 2003
DTCL-MPCVD装置によるカーボン系薄膜の作製とそのプラズマパラメータの測定（Ⅱ）
会田太, 重村昌人, 加藤勇
第50回応用物理学関係連合講演会 講演予稿集 27a/E, 8 2003
PL characteristics from a-Si:H nanoball films fabricated by DTCL-MPVD(2)
Yosuke Motoyama, Ryouhei Saito, Isamu Kato, Hiroshi Kezuka, Tsunenori Suzuki
Extended Abstracts (The 50th Spring Meeting 2003): The Japan Society of Applied Physics 28p/ZF, 2 2003
Fabrication of the Optical Waveguide with Nano-Structure by DTLC-MPCVD method and the Characteristics (Ⅱ)
Masatsugu Oshima, Masato Shinohara, Naoyuki Tamaru, Isamu Kato
Extended Abstracts (The 50th Spring Meeting 2003): The Japan Society of Applied Physics 28a/Zk, 4 2003
Fabrication of Carbon Thin Films and Measurment of Plasma Parameter by DTLC-MPCVD System(Ⅱ)
Futoshi Aida, Shigemura Masato, Isamu Kato
Extended Abstracts (The 50th Spring Meeting 2003): The Japan Society of Applied Physics 27a/E, 8 2003
Film properties and PL Characteristics of Hydrogenafed Amorphous Silicon Nanoball Film using Ar-H2 mixture Gas plasma
斉藤良平, 元山陽介, 加藤勇, 毛塚博史, 鈴木恒則
第20回プラズマプロセッシング研究会プロシーディングス 1/1-34 2003
Fabrication of the Optical Waveguide with Nano-Structure by DTLC-MPCVD method and the Characteristics
大島正資, 篠原正仁, 浦野真理, 田丸直幸, 加藤勇
第20回プラズマプロセッシング研究会プロシーディングス 1/1-34 2003
Film properties and PL Characteristics of Hydrogenafed Amorphous Silicon Nanoball Film using Ar-H2 mixture Gas plasma
Ryouhei Saito, Yousuke Motoyama, Isamu Kato, Hiroshi Kezuka, Tsunenori Suzuki
Plasma Science Symposium 2003/The 20nd Symposium on Plasma Processing 1/1-34 2003
Fabrication of the Optical Waveguide with Nano-Structure by DTLC-MPCVD method and the Characteristics
Masanori Oshima, Syoji Shinohara, Makoto Urano, Naoyuki Tamaru, Isamu Kato
Plasma Science Symposium 2003/The 20nd Symposium on Plasma Processing 1/1-34 2003
PL characteristics from a-Si:H nanoball films fabricated using Hydrogen Plasma by DTCL-MPVD
Syuhei Yoshida, Isamu Kato
Extended Abstracts (The 64th Autumn Meeting 2003): The Japan Society of Applied Physics 30p/ZE, 3 2003
Fabrication of SiN nanoball films by DTCL-MPVD System and their PL Characteristics
Syuhei Yoshida, Isamu Kato
Extended Abstracts (The 64th Autumn Meeting 2003): The Japan Society of Applied Physics 1a/ZG, 3 2003
Blueshift of Photo luminescense from a-Si:H nanoball films fabricated by DTCL-MPCVD(Ⅱ)
Fumiaki Suzuki, Yosuke Motoyama, Isamu Kato, Tsunenori Suzuki, Kazuya Oguri
Extended Abstracts (The 64th Autumn Meeting 2003): The Japan Society of Applied Physics 30p/ZE, 5 2003
Blueshift of Photo luminescense from a-Si:H nanoball films fabricated by DTCL-MPCVD(Ⅰ)
Yosuke Motoyama, Fumiaki Suzuki, Isamu Kato, Tsunenori Suzuki, Kazuya Oguri
Extended Abstracts (The 64th Autumn Meeting 2003): The Japan Society of Applied Physics 30p/ZE, 4 2003
PL characteristics from a-Si:H nanoball films fabricated by DTCL-MPVD(2)
Yosuke Motoyama, Ryouhei Saito, Isamu Kato, Hiroshi Kezuka, Tsunenori Suzuki
Extended Abstracts (The 50th Spring Meeting 2003): The Japan Society of Applied Physics 28p/ZF, 2 2003
Fabrication of the Optical Waveguide with Nano-Structure by DTLC-MPCVD method and the Characteristics (Ⅱ)
Masatsugu Oshima, Masato Shinohara, Naoyuki Tamaru, Isamu Kato
Extended Abstracts (The 50th Spring Meeting 2003): The Japan Society of Applied Physics 28a/Zk, 4 2003
Fabrication of Carbon Thin Films and Measurment of Plasma Parameter by DTLC-MPCVD System(Ⅱ)
Futoshi Aida, Shigemura Masato, Isamu Kato
Extended Abstracts (The 50th Spring Meeting 2003): The Japan Society of Applied Physics 27a/E, 8 2003
Film properties and PL Characteristics of Hydrogenafed Amorphous Silicon Nanoball Film using Ar-H2 mixture Gas plasma
Ryouhei Saito, Yousuke Motoyama, Isamu Kato, Hiroshi Kezuka, Tsunenori Suzuki
Plasma Science Symposium 2003/The 20nd Symposium on Plasma Processing 1/1-34 2003
Fabrication of the Optical Waveguide with Nano-Structure by DTLC-MPCVD method and the Characteristics
Masanori Oshima, Syoji Shinohara, Makoto Urano, Naoyuki Tamaru, Isamu Kato
Plasma Science Symposium 2003/The 20nd Symposium on Plasma Processing 1/1-34 2003
Ultraviolet photon induced bulk, surface and interface modifications in n-Hg0.8Cd0.2Te in hydrogen environment
OP Agnihotri, R Pal, KD Yang, SH Bae, SJ Lee, MY Lee, WS Choi, JH Choi, HC Lee, Kato, I
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 41 ( 7A ) 4500 - 4502 2002.07
Characterization of photoluminescence of a-Si:H nanoball films fabricated by microwave plasma CVD
加藤勇, 毛塚博史, 松本貴之, 斉藤良平, 鈴木恒則
Vacuum Vol65 PAGE 439-442 2002
a-Si:H/Si3N4超薄膜多層膜の作製とPL発光特性
浦野真理, 小山慎一, 加藤勇
第63回応用物理学会学術講演会講演予稿集 26p-ZM-18 2002
a-Si:H/Si3N4多層膜光導波路の偏光特性（Ⅵ）
篠原正仁, 大島正資, 田丸直幸, 加藤勇
第63回応用物理学会学術講演会講演予稿集 24a-A-11 2002
DTCL-MPCVD法により作製したa-Si:Hナノボール膜からのPL発光特性
斉藤良平, 加藤勇, 毛塚博史, 鈴木恒則
第63回応用物理学会学術講演会講演予稿集 25a-ZD-1 2002
DTCL-MPCVD装置によるカーボン系薄膜の作製とそのプラズマパラメータの測定
重村昌人, 会田太, 加藤勇
第63回応用物理学会学術講演会講演予稿集 24a-ZM-19 2002
polarization properties of a-Si:H/SiN multilayer optical waveguide
Syoji Shinohara, Makoto Urano, Naoyuki Tamaru, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 24a-A-11 2002
PL characteristics from a-Si:H nanoball films fabricated by DTCL-MPCVD
Ryouhei Saito, Isamu Kato, Hiroshi Kezuka, Tsunenori Suzuki
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 25a-ZD-1 2002
Fabrication of carbon thin films and measurement of plasma parameter By DTCL-MPCVD system
Masato Shigemura, Futoshi Aida, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 24a-ZM-19 2002
Fabrication of a-Si:H/SiN ultra multilayer films nad its photoluminescence properties
Makoto Urano, Shinichi Koyama, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 26p-ZM-18 2002
Dependence of Photoluminescence Characteristics of Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films on Ion Bombardment Ener
加藤勇, 松本貴之
Jpn. J. Appl. Phys. Vol. 41. pp5205-5209 2002
TEM-ovservations of the surface of a-Si:H nanoball films prepared by micro-plasma CVD System
H.Kezuka, I.Kato, T.Matsumoto, R.Saito, T.Suzuki
Sixteenth SixteenthEuropean Conference on Atomic&Molecular Physics of Ionized Gases Fifth International Conference on Reactive Plasmas(Joint 2002
Dependence of PL characteristics of a-Si:H nanoball films Fabricated by double tubed coaxial line type MPCVD System
R.Saito, I.Kato, H.Kezuka
Sixteenth SixteenthEuropean Conference on Atomic&Molecular Physics of Ionized Gases Fifth International Conference on Reactive Plasmas(Joint 2002
二重管式同軸線路型MPCVD装置を用いて作製したSi系発光材料の研究（10）
斉藤良平, 松本貴之, 加藤勇, 毛塚博史, 鈴木恒則
第49回応用物理学関係連合講演会講演予稿集 29a-YG-2 2002
二重管式同軸線路型MPCVD装置を用いて作製したSi系発光材料の研究(10)
斉藤良平, 松本貴之, 加藤勇, 毛塚博史, 鈴木恒則
第63回応用物理学会学術講演会 29a-Y6-2 2002
二重管式同軸線路型MPCVD装置をによるカーボン系薄膜の作製とそのプラズマパラメータの測定
重村昌人, 野田俊成, 加藤勇
第63回応用物理学会学術講演会 27a-B-10 2002
二重管式同軸線路型MPCVD装置によるカーボン系薄膜の作製とそのプラズマパラメータの測定
重村昌人, 野田俊成, 加藤勇
第49回応用物理学関係連合講演会講演予稿集 27a-B-10 2002
二重管式同軸線路型MPCVD装置によるa-Si:H/Si3N4多層膜の作製（Ⅴ）
小山慎一, 浦野真理, 菅井貴義, 加藤勇
第49回応用物理学関係連合講演会講演予稿集 27p-K-1 2002
二重管式同軸線路型MPCVD装置によるa-Si:H /Si3N4多層膜の作製とプラズマ測定
浦野真理, 小山慎一, 菅井貴義, 加藤勇
第63回応用物理学会学術講演会 28a-D-4 2002
二重管式同軸線路型MPCVD装置によるa-Si:H /Si3N4多層膜の作製(Ⅴ)
小山慎一, 浦野真理, 菅井貴義, 加藤勇
第63回応用物理学会学術講演会 27P-K-1 2002
同軸線路型MPCVD装置によるa-Si:H/Si3N4多層膜の作製とプラズマ測定
浦野真理, 小山慎一, 菅井貴義, 加藤勇
第49回応用物理学関係連合講演会講演予稿集 28a-D-4 2002
The study of Si luminescence material fabricated using DTCL-MPCVD
Ryouhei Saito, Takayuki Matsumoto, Isamu Kato, Hiroshi Kezuka and, Tsunenori Suzuki
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 29a-Y6-2 2002
Pabrication of carbon thin films and measurement of plasma parameter by DTCL-MPCVD system
Masato Shigemura, Toshinari Noda, Isamu Kato
Extended Abstracts(The 49th Spring Meeting, 2002) ; The Japan Society of Applied Physics and Related Societies 27a-B-10 2002
Fabrication of a-Si:H/SiN multilayer films by DTCL-MPCVD system and its plasma measurement
Makoto Urano, Shinichi Koyama, Takayoshi Sugai and, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 28a-D-4 2002
Fabrication of a-Si:H/SiN multilayer films by DTCL-MPCVD system (5)
Makoto Urano, Shinichi Koyama, Takayoshi Sugai and, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 27P-K-1 2002
polarization properties of a-Si:H/SiN multilayer optical waveguide
Syoji Shinohara, Makoto Urano, Naoyuki Tamaru, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 24a-A-11 2002
PL characteristics from a-Si:H nanoball films fabricated by DTCL-MPCVD
Ryouhei Saito, Isamu Kato, Hiroshi Kezuka, Tsunenori Suzuki
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 25a-ZD-1 2002
Fabrication of carbon thin films and measurement of plasma parameter By DTCL-MPCVD system
Masato Shigemura, Futoshi Aida, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 24a-ZM-19 2002
Fabrication of a-Si:H/SiN ultra multilayer films nad its photoluminescence properties
Makoto Urano, Shinichi Koyama, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 26p-ZM-18 2002
TEM-ovservations of the surface of a-Si:H nanoball films prepared by micro-plasma CVD System
H.Kezuka, I.Kato, T.Matsumoto, R.Saito, T.Suzuki
Sixteenth SixteenthEuropean Conference on Atomic&Molecular Physics of Ionized Gases Fifth International Conference on Reactive Plasmas(Joint 2002
Dependence of PL characteristics of a-Si:H nanoball films Fabricated by double tubed coaxial line type MPCVD System
R.Saito, I.Kato, H.Kezuka
Sixteenth SixteenthEuropean Conference on Atomic&Molecular Physics of Ionized Gases Fifth International Conference on Reactive Plasmas(Joint 2002
The study of Si luminescence material fabricated using DTCL-MPCVD
Ryouhei Saito, Takayuki Matsumoto, Isamu Kato, Hiroshi Kezuka and, Tsunenori Suzuki
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 29a-Y6-2 2002
Pabrication of carbon thin films and measurement of plasma parameter by DTCL-MPCVD system
Masato Shigemura, Toshinari Noda, Isamu Kato
Extended Abstracts(The 49th Spring Meeting, 2002) ; The Japan Society of Applied Physics and Related Societies 27a-B-10 2002
Fabrication of a-Si:H/SiN multilayer films by DTCL-MPCVD system and its plasma measurement
Makoto Urano, Shinichi Koyama, Takayoshi Sugai and, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 28a-D-4 2002
Fabrication of a-Si:H/SiN multilayer films by DTCL-MPCVD system (5)
Makoto Urano, Shinichi Koyama, Takayoshi Sugai and, Isamu Kato
Extended Abstracts(The 63th Autumn Meeting, 2002) ; The Japan Society of Applied Physics 27P-K-1 2002
Photoluminescence from Thermally Oxidized Hydrogenated Amorphous Silicon Nanoball Films Fablicated by Double-Tubed-Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposi
加藤勇, 松本貴之, O.P.AGNIHOTRI
Jpn J Appl Phys Part1 VOL. 40, NO. 12 PAGE 6862-6867 2001
Nanostructures of Si Luminescence Materials Fablicated by Microwave Plasma CVD
H.Kezuka, I.Kato, R.Saito, T.Suzuki
IUVSTA 15<SUP>th</SUP> International Vacuum Congress(IVC-15), AVS 48th International Symposium(AVS-48)International Conference on Solid Surface(ICSS-11) 2001
Si Luminescence Materials Fablicated Using the Double-Tubed Coaxial Line-Type Microwave Plasma CVD
加藤勇, 毛塚博史, 松本貴之, 斉藤良平, 鈴木恒則
ADVANCE IN APPLIED PLASMA SCIENCE 2001
Si Luminescence Materials Fablicated Using the Double-Tubed Coaxial Line-Type Microwave Plasma CVD
Isamu Kato.Takayuki Matsumoto, Hiroshi Kezuka, Tsunenori Suzuki
ADVANCE IN APPLIED PLASMA SCIENCE 2001
Si Luminescence Materials Fabricated Using the Double Tubed Coaxial Line-Type Microwave Plasma CVD
加藤勇, 毛塚博史, 松本貴之, 斉藤良平, 鈴木恒則
Institute of Applied Plasma Science Vol. 13, 2001 PAGE162-172 2001
Si Luminescence Materials Fabricated Using the Double Tubed Coaxial Line-Type Microwave Plasma CVD
Isamu Kato.Takayuki Matsumoto, Hiroshi Kezuka, Tsunenori Suzuki
Institute of Applied Plasma Science Vol. 13, 2001 PAGE162-172 2001
二重管式同軸線路形MPCVD装置を用いて作製したa-Si:H/Si3N4多層膜の膜質とその光回路素子への応用
加藤勇, 匂坂雅彦, 菅井貴義, 上垣内岳司
電子情報通信学会論文誌 VOL. J84-C, NO. 4 PAGE. 245-2 2001
Quality of a-Si:H/Si3N4 Multilayer Films Fabricated by Double Tubed Coaxial Line Type MPCVD System and Application of the Films to Optical Circuit Element
加藤勇, 匂坂雅彦, 菅井貴義, 上垣内岳司
Electronics and Communications in Japan 2001
Quality of a-Si:H/Si3N4 Multilayer Films Fabricated by Double Tubed Coaxial Line Type MPCVD System and Application of the Films to Optical C
Isamu Kato, Takayoshi Sugai, Syoji kamigaichi, Masahiko Sagisaka
Electronics and Communication in Japan, Part2. Vol. 84 No. 12 2001
二重管式同軸線路型ＭＰＣＶＤ装置を用いて作製したSi系発光材料の研究（Ⅷ）
松本貴之, 加藤勇, 毛塚博史, 鈴木恒則
第48回応用物理学関係連合講演会 28p-YL-4 2001
二重管式同軸線路型ＭＰＣＶＤ装置におけるa-Si:H/Si3N4多層膜の作製（Ⅲ）
菅井貴義, 加藤勇
第48回応用物理学関係連合講演会 30a-ZT-1 2001
二重管式同軸線路型ＭＰＣＶＤ装置におけるH2-Ar混合プラズマの空間分布、およびカーボン形薄膜の作成
野田俊成, 加藤勇
第48回応用物理学関係連合講演会 28a-N-9 2001
二重管式同軸線路型ＭＰＣＶＤ装置において基板温度がa-Si:H膜に与える影響（Ⅲ）
山口誠彦, 中野有喜, 加藤勇
第48回応用物理学関係連合講演会 31p-ZQ-5 2001
二重管式同軸線路型MPCVD装置を用いて作製したSi系発光材料の研究（9）
松本貴之, 加藤勇, 毛塚博史, 鈴木恒則
第62回応用物理学会学術講演会講演予稿集 28p-YL-4 2001
二重管式同軸線路型MPCVD装置の改造と、そのH2プラズマの空間分布の予測、およびカーボン系薄膜の作製
野田俊成, 加藤勇
第62回応用物理学会学術講演会講演予稿集 28a-N-9 2001
二重管式同軸線路型MPCVD装置によるa-Si:H/Si3N4多層膜の作製（Ⅳ）
松本貴之, 斉藤良平, 加藤勇, 毛塚博史, 鈴木恒則
第62回応用物理学会学術講演会講演予稿集 11p-P3-1 2001
a-Si:H/Si3N4多層膜光導波路の偏光特性（Ⅲ）
匂坂雅彦, 小山慎一, 篠原正仁, 田丸直幸, 加藤勇
第48回応用物理学関係連合講演会 31p-H-3 2001
Quality of a-Si:H/Si3N4 Multilayer Films Fabricated by Double Tubed Coaxial Line Type MPCVD System and Application of the Films to Optical C
加藤勇, 匂坂雅彦, 菅井貴義, 上垣内岳司
Electronics and Communication in Japan, Part2. Vol. 84 No. 12 2001
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD System((]G0008[))
Takayuki Matsumoto, Hiroshi Kezuka, Tsunenori Suzuki, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 28p-YL-4 2001
Spatial Distribution of Ar-H_2 Mixtured Plasma and Fabrication of Carbon Thin Films by Double Tubed Coaxial Line Type MPCVD
Toshinari Noda, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 28a-N-9 2001
Polarization properties of a-Si : H/Si_3N_4 multilayer optical waveguides((]G0003[))
Masahiko Sagisaka, Shinichi Koyama, Masato Shinohara, Naoyuki Tamaru, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 31p-H-3 2001
Influence of Substrate Temperature on a a-Si : H Film Fabricated in Double Tubed Coaxial Line Type MPCVD
Seihiko Yamaguchi, Yuki Nakano, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 31p-ZQ-5 2001
Fabrication of a-Si : H/Si_3N_4 multilayer films by Double Tubed Coaxial Line Type MPCVD System.((]G0003[))
Takayoshi Sugai, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 30a-ZT-1 2001
二重式同軸線路型MPCVD装置の改造とそのH2プラズマの空間分布、およびカーボン系薄膜の作製
松本貴之, 加藤勇
第18回プラズマプロセッシング研究会プロシーディングス 11P-ZG-14 2001
二重管式同軸線路型MPCVD装置を用いて作製したSi系発光材料の研究(9)
菅井貴義, 加藤勇
第18回プラズマプロセッシング研究会プロシーディングス 11P-P3-1 2001
二重管式同軸線路型MPCVD装置によるa-Si:H/ Si3N4多層膜の作製(Ⅳ)
匂坂雅彦, 菅井貴義, 田丸直幸, 加藤勇
第18回プラズマプロセッシング研究会プロシーディングス 12P-ZA-3 2001
QUORITY OF a-SiH/Si3N4 MULTILAYER FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCND SYSTEM(Ⅱ)
菅井貴義, 加藤勇
第18回プラズマプロセッシング研究会 プロシ－ディングス Vol. P2-75, PP. 427-428 2001
FILM QUALITY OF A a-Si:H/Si3N4 MULTILAYAR FILMS AND PROPAGATE PROPERTIES OF OPTICAL WAVEGUIDES USING THE MULTILAYER FILMS
匂坂雅彦, 菅井貴義, 田丸直幸, 加藤勇
第18回プラズマプロセッシング研究会 プロシ－ディングス Vol. P2-76, PP. 429-430 2001
DEPENDENCE OF PL CHARACTERISTICS OF a-Si:H NANOBALL FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM ON SUBSTRATE POSITION
松本貴之, 加藤勇
第18回プラズマプロセッシング研究会 プロシ－ディングス Vol. P2-74, PP. 425-426 2001
QUORITY OF a-SiH/Si3N4 MULTILAYER FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCND SYSTEM(Ⅱ)
Takayoshi Sugai, Isamu Kato
Plasma Science Symposium 2001/The 18nd Symposium on Plasma Processing Vol. P2-75, PP. 427-428 2001
FILM QUALITY OF A a-Si:H/Si3N4 MULTILAYAR FILMS AND PROPAGATE PROPERTIES OF OPTICAL WAVEGUIDES USING THE MULTILAYER FILMS
Masahiko Sagisaka, Takayoshi Sugai, Isamu Kato
Plasma Science Symposium 2001/The 18nd Symposium on Plasma Processing Vol. P2-76, PP. 429-430 2001
DEPENDENCE OF PL CHARACTERISTICS OF a-Si:H NANOBALL FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM ON SUBSTRATE POSITION
Takayuki Matsumoto, Isamu Kato
Plasma Science Symposium 2001/The 18nd Symposium on Plasma Processing Vol. P2-74, PP. 425-426 2001
Nanostructures of Si Luminescence Materials Fablicated by Microwave Plasma CVD
H.Kezuka, I.Kato, R.Saito, T.Suzuki
IUVSTA 15<SUP>th</SUP> International Vacuum Congress(IVC-15), AVS 48th International Symposium(AVS-48)International Conference on Solid Surface(ICSS-11) 2001
Si Luminescence Materials Fablicated Using the Double-Tubed Coaxial Line-Type Microwave Plasma CVD
Isamu Kato.Takayuki Matsumoto, Hiroshi Kezuka, Tsunenori Suzuki
ADVANCE IN APPLIED PLASMA SCIENCE 2001
Si Luminescence Materials Fabricated Using the Double Tubed Coaxial Line-Type Microwave Plasma CVD
Isamu Kato.Takayuki Matsumoto, Hiroshi Kezuka, Tsunenori Suzuki
Institute of Applied Plasma Science Vol. 13, 2001 PAGE162-172 2001
Quality of a-Si:H/Si3N4 Multilayer Films Fabricated by Double Tubed Coaxial Line Type MPCVD System and Application of the Films to Optical C
Isamu Kato, Takayoshi Sugai, Syoji kamigaichi, Masahiko Sagisaka
Electronics and Communication in Japan, Part2. Vol. 84 No. 12 2001
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD System((]G0008[))
Takayuki Matsumoto, Hiroshi Kezuka, Tsunenori Suzuki, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 28p-YL-4 2001
Spatial Distribution of Ar-H_2 Mixtured Plasma and Fabrication of Carbon Thin Films by Double Tubed Coaxial Line Type MPCVD
Toshinari Noda, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 28a-N-9 2001
Polarization properties of a-Si : H/Si_3N_4 multilayer optical waveguides((]G0003[))
Masahiko Sagisaka, Shinichi Koyama, Masato Shinohara, Naoyuki Tamaru, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 31p-H-3 2001
Influence of Substrate Temperature on a a-Si : H Film Fabricated in Double Tubed Coaxial Line Type MPCVD
Seihiko Yamaguchi, Yuki Nakano, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 31p-ZQ-5 2001
Fabrication of a-Si : H/Si_3N_4 multilayer films by Double Tubed Coaxial Line Type MPCVD System.((]G0003[))
Takayoshi Sugai, Isamu Kato
Extended Abstracts(The 48th Spring Meeting, 2001) ; The Japan Society of Applied Physics and Related Societies 30a-ZT-1 2001
QUORITY OF a-SiH/Si3N4 MULTILAYER FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCND SYSTEM(Ⅱ)
Takayoshi Sugai, Isamu Kato
Plasma Science Symposium 2001/The 18nd Symposium on Plasma Processing Vol. P2-75, PP. 427-428 2001
FILM QUALITY OF A a-Si:H/Si3N4 MULTILAYAR FILMS AND PROPAGATE PROPERTIES OF OPTICAL WAVEGUIDES USING THE MULTILAYER FILMS
Masahiko Sagisaka, Takayoshi Sugai, Isamu Kato
Plasma Science Symposium 2001/The 18nd Symposium on Plasma Processing Vol. P2-76, PP. 429-430 2001
DEPENDENCE OF PL CHARACTERISTICS OF a-Si:H NANOBALL FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM ON SUBSTRATE POSITION
Takayuki Matsumoto, Isamu Kato
Plasma Science Symposium 2001/The 18nd Symposium on Plasma Processing Vol. P2-74, PP. 425-426 2001
New particles technology for (RE)BCO-superconductoor(RE-Y) using jet mill.
H.Kezuka, I.Kato
Pacifichem 2000 Meeting 2000
New particles technology for(RE)BCO-superconductoor(RE-Y)using jet mill.
H.Kezuka, I.Kato
Pacifichem 2001 Meeting 2000
Effect of Ar+ Ion Bombardment During Hydrogenated Amorphous Silicon FilmGrowth in Plasma Chemical Vapor Deposition System.
加藤勇, 中野有喜, 山口誠彦
Jpn J Appl Phys Part1 VOL. 39, NO. 11 PAGE 6404-6409 2000
Effect of Ar+ Ion Bombardment During Hydrogenated Amorphous Silicon Film Growth in Plasma Chemical Vapor Deposition System
加藤勇, 中野有喜, 山口誠彦
Jpn.J.Appl.Phys. Vol.39(2000) Vol.39(2000) ( Part1,No.11 ) 6404 2000
二重管式同軸線路形ＭＰＣＶＤ装置におけるシース電圧の制御（Ⅱ）
中野有喜, 山口誠彦, 加藤勇
第61回応用物理学会学術講演会 3p-ZR-14 2000
二重管式同軸線路形MPCVD装置を用いて作製したSi系発光材料の研究（Ⅶ）
松本貴之, 加藤勇
第61回応用物理学会学術講演会 6a-ZK-5 2000
同軸線路形MPCVD装置において放電ガスとしてNeガスを用いたa-Si:H膜の作製（Ⅱ）
菅井貴義, 加藤勇
第61回応用物理学会学術講演会 3p-ZR-15 2000
三次元光導波路を用いた半導体極薄膜の光学定数の測定（Ⅱ）
坂井典生, 田丸直幸, 加藤勇
第61回応用物理学会学術講演会 6a-D-9 2000
a-Si:H/Si3N4多層膜光導波路の偏光特性（Ⅱ）
匂坂雅彦, 田丸直幸, 加藤勇
第61回応用物理学会学術講演会 3a-Q-31 2000
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD System((]G0007[))
Takayuki Matsumoto, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 6a-ZK-5 2000
Polarization properties of a-Si : H/Si_3N_4 multilayer optical waveguides((]G0002[))
Masahiko Sagisaka, Naoyuki Tamaru, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 3a-Q-31 2000
Optical Constant Measurement Ultra Thin Films Using a Three Dimensional Waveguide((]G0002[))
Masahiko Sagisaka, Naoyuki Tamaru, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 3a-Q-31 2000
Fabrication of a-Si : H films using Ne gas as discharge gas by coaxial line type MPCVD
Yoshiaki Sugai, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 3p-ZR-15 2000
Control of Sheath Voltage in Double Tubed Coaxial Line Type MPCVD System((]G0002[))
Seihiko Yamaguchi, Yuki Nakano, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 3p-ZR-14 2000
New Particles Technology for Oxide-Superconductor Using Dry and Wet-Type Jet Mill
H.Kezuka, I.Kato, T.Shirane, M.Ikeda
Proceedings of The 6th International Conference on Properties andApplications of Dielectric Materials Vol.3(2001) 167 - 172 2000
New Particles Technology for Oxide-Superconductor Using Dry and Wet-Type Jet Mill
H.Kezuka, I.Kato, T.Suzuki, M.Ikeda
Proceedings of The 7th International Conference on Properties and Applications of Dielectric Materials 3(2001)/,167-172 2000
二重管式同軸線路形MPCVD装置を用いて作製したSi系発光材料の研究（Ⅵ）
松本貴之, 河原吉男, 加藤勇
第47回応用物理学関係連合講演会 31a-YC-Ⅱ 2000
二重管式同軸線路形MPCVD装置を用いたカーボン系薄膜の作製（Ⅱ）
野田俊成, 大塚崇, 加藤勇
第47回応用物理学関係連合講演会 28a-YE-Ⅰ 2000
同軸線路形MPCVD装置において放電ガスとしてNeガスを用いたa-Si:H膜の作製
菅井貴義, 上垣内岳司, 加藤勇
第47回応用物理学関係連合講演会 30p-C-Ⅰ 2000
縦磁界印加同軸線路形MPCVD装置において基板温度がa-Si:H膜に与える影響（Ⅱ）
中野有喜, 山口誠彦, 加藤勇
第47回応用物理学関係連合講演会 30p-ZF-Ⅱ 2000
三次元光導波路を用いた半導体極薄膜の光学定数の測定
坂井典生, 加藤勇
第47回応用物理学関係連合講演会 30a-B-Ⅲ 2000
Si:H/Si3N4多層膜光導波路の偏光特性
匂坂雅彦, 加藤勇
第47回応用物理学関係連合講演会 30p-B-Ⅲ 2000
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD System((]G0006[))
Takayuki Matsumoto, Yoshio Kawara, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 31a-YC-Ⅱ 2000
Polarization properties of a-Si : H/Si_3N_4 multilayer optical waveguides
Masahiko Sagisaka, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 30p-B-Ⅲ 2000
Optical Constant Measurement Ultra Thin Films Using a Three Dimensional Waveguide
Norio Sakai, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 30a-B-Ⅲ 2000
Influence of substrate temperature on a a-Si : H Film in Longitudinal Magnetic Field Applied to Coaxial Line Type
Yuki Nakano, Seihiko Yamaguchi, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 30p-ZF-Ⅱ 2000
Fabrication of a-Si : H films using Ne gas as discharge gas by coaxial line type MPCVD system
Takayoshi Sugai, Syoji kamigaichi, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 30p-C-Ⅰ 2000
Fabrication of Carbon thin films by Double Tubed Coaxial Line Type MPCVD System((]G0002[))
Toshinari Noda, Takashi Otsuka, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 28a-YE-Ⅰ 2000
QUORITY OF a-Si:H/Si３N４ MULTILAYER FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINEFABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM
上垣内岳司, 加藤勇
第17回プラズマプロセッシング研究会 プロシーディングス Vol.A2-5, PP.239-242 2000
POLARIZATION PROPERTIES OF a-Si:H/Si３N４ MULTILAYERS OPTICAL WAVEGUIDES
匂坂雅彦, 加藤勇
第17回プラズマプロセッシング研究会 プロシーディングス Vol.A2-6, PP.243-246 2000
FABRICATION OF POLYMER-LIKE a-C:H FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM
大塚崇, 加藤勇
第17回プラズマプロセッシング研究会 プロシーディングス Vol.A2-1, PP.223-226 2000
DEPENDENCE OF PL CHARACTERISTICS OF a-Si:H NANOBALL FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM ON ION BOMBARDMENT ENERGY
河原吉男, 加藤勇
第17回プラズマプロセッシング研究会 プロシーディングス Vol.B6-7, PP.641-644 2000
QUORITY OF a-Si:H/Si３N４ MULTILAYER FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINEFABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM
Syouji Kamigaichi, Isamu Kato
Plasma Science Symposium 2000/The 18nd Symposium on Plasma Processing Vol.A2-5, PP.239-242 2000
POLARIZATION PROPERTIES OF a-Si:H/Si３N４ MULTILAYERS OPTICAL WAVEGUIDES
Masahiko Sagisaka, Isamu Kato
Plasma Science Symposium 2000/The 19nd Symposium on Plasma Processing Vol.A2-6, PP.243-246 2000
FABRICATION OF POLYMER-LIKE a-C:H FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM
Takashi Otsuka, Isamu Kato
Plasma Science Symposium 2000/The 17nd Symposium on Plasma Processing Vol.A2-1, PP.223-226 2000
DEPENDENCE OF PL CHARACTERISTICS OF a-Si:H NANOBALL FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM ON ION BOMBARDMENT ENERGY
Yoshio Kawara, Isamu Kato
Plasma Science Symposium 2000/The 20nd Symposium on Plasma Processing Vol.B6-7, PP.641-644 2000
New particles technology for(RE)BCO-superconductoor(RE-Y)using jet mill.
H.Kezuka, I.Kato
Pacifichem 2001 Meeting 2000
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD System((]G0007[))
Takayuki Matsumoto, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 6a-ZK-5 2000
Polarization properties of a-Si : H/Si_3N_4 multilayer optical waveguides((]G0002[))
Masahiko Sagisaka, Naoyuki Tamaru, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 3a-Q-31 2000
Optical Constant Measurement Ultra Thin Films Using a Three Dimensional Waveguide((]G0002[))
Masahiko Sagisaka, Naoyuki Tamaru, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 3a-Q-31 2000
Fabrication of a-Si : H films using Ne gas as discharge gas by coaxial line type MPCVD
Yoshiaki Sugai, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 3p-ZR-15 2000
Control of Sheath Voltage in Double Tubed Coaxial Line Type MPCVD System((]G0002[))
Seihiko Yamaguchi, Yuki Nakano, Isamu Kato
Extended Abstracts(The 61th Autumn Meeting, 2000) ; The Japan Society of Applied Physics 3p-ZR-14 2000
New Particles Technology for Oxide-Superconductor Using Dry and Wet-Type Jet Mill
H.Kezuka, I.Kato, T.Suzuki, M.Ikeda
Proceedings of The 7th International Conference on Properties and Applications of Dielectric Materials 3(2001)/,167-172 2000
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD System((]G0006[))
Takayuki Matsumoto, Yoshio Kawara, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 31a-YC-Ⅱ 2000
Polarization properties of a-Si : H/Si_3N_4 multilayer optical waveguides
Masahiko Sagisaka, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 30p-B-Ⅲ 2000
Optical Constant Measurement Ultra Thin Films Using a Three Dimensional Waveguide
Norio Sakai, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 30a-B-Ⅲ 2000
Influence of substrate temperature on a a-Si : H Film in Longitudinal Magnetic Field Applied to Coaxial Line Type
Yuki Nakano, Seihiko Yamaguchi, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 30p-ZF-Ⅱ 2000
Fabrication of a-Si : H films using Ne gas as discharge gas by coaxial line type MPCVD system
Takayoshi Sugai, Syoji kamigaichi, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 30p-C-Ⅰ 2000
Fabrication of Carbon thin films by Double Tubed Coaxial Line Type MPCVD System((]G0002[))
Toshinari Noda, Takashi Otsuka, Isamu Kato
Extended Abstracts(The 47th Spring Meeting, 2000) ; The Japan Society of Applied Physics and Related Societies 28a-YE-Ⅰ 2000
QUORITY OF a-Si:H/Si３N４ MULTILAYER FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINEFABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM
Syouji Kamigaichi, Isamu Kato
Plasma Science Symposium 2000/The 18nd Symposium on Plasma Processing Vol.A2-5, PP.239-242 2000
POLARIZATION PROPERTIES OF a-Si:H/Si３N４ MULTILAYERS OPTICAL WAVEGUIDES
Masahiko Sagisaka, Isamu Kato
Plasma Science Symposium 2000/The 19nd Symposium on Plasma Processing Vol.A2-6, PP.243-246 2000
FABRICATION OF POLYMER-LIKE a-C:H FILMS BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM
Takashi Otsuka, Isamu Kato
Plasma Science Symposium 2000/The 17nd Symposium on Plasma Processing Vol.A2-1, PP.223-226 2000
DEPENDENCE OF PL CHARACTERISTICS OF a-Si:H NANOBALL FILMS FABRICATED BY DOUBLE TUBED COAXIAL LINE TYPE MPCVD SYSTEM ON ION BOMBARDMENT ENERGY
Yoshio Kawara, Isamu Kato
Plasma Science Symposium 2000/The 20nd Symposium on Plasma Processing Vol.B6-7, PP.641-644 2000
Photoluminescence from a-Si:H Nanoball Films Fabricated by Double Tubed Coaxial Line Tipe Microwave Plasma CVD system
加藤 勇, 河原 吉男, O.P.Agnihotri
Proceedings of the Tenth International Workshop on the Phisics of Semiconductor Devices Ⅱ; PP.1107 1999
Photoluminescence from a-Si : H Nanoball Films Fabricated by Double Tubed Coaxial Line Tipe Microwave Plasma CVD system
Isamu Kato, yoshio Kawara, O.P.Agnihotri
Proceedings of the Tenth International Workshop on the Phisics of Semiconductor Devices Ⅱ; PP.1107 1999
Influence of Hydrogen on Losses in Silicon Oxynitride Planar Optical Wavaguides
B.S.Sabu, O.P.Agnihotri, S.C.Jain, R.Mertens, 加藤 勇
Proceedings of the Tenth International Workshop on the Phisics of Semiconductor Devices Ⅰ; PP.438 1999
二重管式同軸線路形MPCVD装置を用いて作製したSi発光材料の研究（Ⅴ）
河原吉男, 加藤勇
第60回応用物理学会学術講演会/応用物理学会 3p-ZN-17 1999
二重管式同軸線路形MPCVD装置を用いたa-C:H膜の作製
大塚崇, 加藤勇
第60回応用物理学会学術講演会/応用物理学会 4a-L-11 1999
二重管式同軸線路形MPCVD装置によるa-Si:H/Si3N4多層膜の作製と応用
上垣内岳司, 匂坂雅彦, 加藤勇
第60回応用物理学会学術講演会/応用物理学会 1p-ZS-9 1999
a-SimaluH/Si3N4 multilayer films by Double Tubed Coaxial Line Type MPCVD System and its Application
Masahiko Sagisaka, Syoji Kamigaichi, Isamu Kato
Extended Abstracts(The 60th Autumn Meeting, 1999) ; The Japan Society of Applied Physics 30p-D-7 1999
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD (V)
Yoshio Kawara, Isamu Kato
Extended Abstracts(The 60th Autumn Meeting, 1999) ; The Japan Society of Applied Physics 3p-ZN-17 1999
Fabrication of a-C : H films by Double Tubed Coaxial Line Type MPCVD System
Takashi Otsuka, Isamu Kato
Extended Abstracts(The 60th Autumn Meeting, 1999) ; The Japan Society of Applied Physics 4a-L-11 1999
二重管式同軸線路形MPCVD装置を用いて作製したSi系発光材料の研究（Ⅳ）
河原吉男, 加藤勇
第46回応用物理学関係連合講演会/応用物理学会 28a-P2-8 1999
二重管式同軸線路形MPCVD装置を用いたカーボン系薄膜の作製
大塚崇, 加藤勇
第46回応用物理学関係連合講演会/応用物理学会 30p-D-1 1999
二重管式同軸線路形MPCVD装置によるa-Si:H/SiN多層膜の作製（Ⅱ）
上垣岳司内, 匂坂雅彦, 加藤勇
第46回応用物理学関係連合講演会/応用物理学会 29a-YD-4 1999
二重管式同軸線路形MPCVD装置によるa-Si:H/Si3N4多層膜の作製法の検討
匂坂雅彦, 上垣岳司内, 加藤勇
第46回応用物理学関係連合講演会/応用物理学会 30p-D-7 1999
縦磁界印加同軸線路形MPCVD装置において基板温度がa-Si:H膜に与える影響
臼田雅之, 中野有喜, 加藤勇
第46回応用物理学関係連合講演会/応用物理学会 31a-YB-3 1999
縦磁界印加同軸線路形MPCVD装置においてシース電圧がa-Si:H膜に与える影響
中野有喜, 臼田雅之, 加藤勇
第46回応用物理学関係連合講演会/応用物理学会 31a-YB-5 1999
The Study of Si Luminescence Material Fabricated Using The Double Tubed Coaxial Line Type MPCVD((]G0004[))
Yoshio Kawara, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 28a-P2-8 1999
Study on fabrication method of a-Si : H/Si3N4 multilayer films by Double Tubed Coaxial Line Type MPCVD System
Masahiko Sagisaka, Syoji Kamigaichi, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 30p-D-7 1999
Influence of Substrate Temperature on a-Si : H Film in Longitudinal Magnetic Field Applied to Coaxial Line Type MPCVD System
Masayuki Usuta, Yuki Nakano, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 31a-YB-3 1999
Influence of Sheath Voltage on a-Si : H Film Longitudinal Magnetic Field Applied to Coaxial Line Type MPCVD System.
Yuki Nakano, Masayuki Usuta, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 31a-YB-5 1999
Fabrication of a-Si : H/Si3N4 multilayer by Double Tubed Coaxial Line Type MPCVD System((]G0002[))
Syoji Kamigaichi, Masahiko Sagisaka, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 29a-YD-4 1999
Fabrication of Carbon thin films by Double Tubed Coaxial Line Type MPCVD System
Takashi Otsuka, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 30p-D-1 1999
Photoluminescence from a-Si : H Nanoball Films Fabricated by Double Tubed Coaxial Line Tipe Microwave Plasma CVD system
Isamu Kato, yoshio Kawara, O.P.Agnihotri
Proceedings of the Tenth International Workshop on the Phisics of Semiconductor Devices Ⅱ; PP.1107 1999
Influence of Hydrogen on Losses in Silicon Oxynitride Planar Optical Wavaguides
B.S.Sabu, O.P.Agnihotri, S.C.Jain, R.Mertens, 加藤 勇
Proceedings of the Tenth International Workshop on the Phisics of Semiconductor Devices Ⅰ; PP.438 1999
a-SimaluH/Si3N4 multilayer films by Double Tubed Coaxial Line Type MPCVD System and its Application
Masahiko Sagisaka, Syoji Kamigaichi, Isamu Kato
Extended Abstracts(The 60th Autumn Meeting, 1999) ; The Japan Society of Applied Physics 30p-D-7 1999
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD (V)
Yoshio Kawara, Isamu Kato
Extended Abstracts(The 60th Autumn Meeting, 1999) ; The Japan Society of Applied Physics 3p-ZN-17 1999
Fabrication of a-C : H films by Double Tubed Coaxial Line Type MPCVD System
Takashi Otsuka, Isamu Kato
Extended Abstracts(The 60th Autumn Meeting, 1999) ; The Japan Society of Applied Physics 4a-L-11 1999
The Study of Si Luminescence Material Fabricated Using The Double Tubed Coaxial Line Type MPCVD((]G0004[))
Yoshio Kawara, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 28a-P2-8 1999
Study on fabrication method of a-Si : H/Si3N4 multilayer films by Double Tubed Coaxial Line Type MPCVD System
Masahiko Sagisaka, Syoji Kamigaichi, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 30p-D-7 1999
Influence of Substrate Temperature on a-Si : H Film in Longitudinal Magnetic Field Applied to Coaxial Line Type MPCVD System
Masayuki Usuta, Yuki Nakano, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 31a-YB-3 1999
Influence of Sheath Voltage on a-Si : H Film Longitudinal Magnetic Field Applied to Coaxial Line Type MPCVD System.
Yuki Nakano, Masayuki Usuta, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 31a-YB-5 1999
Fabrication of a-Si : H/Si3N4 multilayer by Double Tubed Coaxial Line Type MPCVD System((]G0002[))
Syoji Kamigaichi, Masahiko Sagisaka, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 29a-YD-4 1999
Fabrication of Carbon thin films by Double Tubed Coaxial Line Type MPCVD System
Takashi Otsuka, Isamu Kato
Extended Abstracts(The 46th Spring Meeting, 1999) ; The Japan Society of Applied Physics and Related Societies 30p-D-1 1999
Photo Luminescence from Si Films Fabricated by Double Tubed Coaxial Line Type Microwave Plasma CVD Apparatus
加藤 勇, 河原 吉男
4th International Conference on Reactive Plasmas,16th Symposium on Plasma Processing and 51st Annual Gaseous Electronics Conference EMP4.17 1998
Photo Luminescence from Si Films Fabricated by Double Tubed Coaxial Line Type Microwave Plasma CVD Apparatus
Isamu Kato, Yoshio Kawara
4TH INTERNATIONAL CONFERENCE ON REACTIVE PLASMAS AND 16TH SYMPOSIUM ON PLASMA PROCESSING Extended Abstracts EMP4.17 1998
二重管式同軸線路形MPCVD装置を用いて作製したSi系発光材料の研究（Ⅲ）
河原吉男, 渡辺一博, 加藤勇
第59回応用物理学会学術講演会/応用物理学会 16p-ZE-16 1998
二重管式同軸線路形MPCVD装置によるa-Si:H/SiN多層膜の作製
上垣内岳司, 岩田直之, 加藤勇
第59回応用物理学会学術講演会/応用物理学会 15p-Z-6 1998
二重管式同軸線路形MPCVD装置におけるシース電圧の制御
岩田直之, 加藤勇
第59回応用物理学会学術講演会/応用物理学会 18a-ZC-8 1998
縦磁界印加同軸線路形MPCVD装置において水素ガス流量がa-Si:H膜に与える影響
臼田雅之, 加藤勇
第59回応用物理学会学術講演会/応用物理学会 15a-Q-3 1998
二重管式同軸線路形MPCVD装置を用いて作製したSi発光材料の研究((]G0003[))
河原吉男, 渡辺一博, 加藤勇
第59回応用物理学会学術講演会講演予稿集 16p-ZE-16 1998
二重管式同軸線路形MPCVD装置によるa-Si:H/SiN多層膜の作製
上垣内岳司, 岩田直之, 加藤勇
第59回応用物理学会学術講演会講演予稿集 15a-Q-3 1998
二重管式同軸線路形MPCVD装置におけるシース電圧の制御
岩田直之, 加藤勇
第59回応用物理学会学術講演会講演予稿集 18a-ZC-8 1998
縦磁界印加同軸線路形MPCVD装置においてH2ガス流量がa-Si:H膜に与える影響
臼田雅之, 飯塚英孝, 森和彦, 加藤勇
第59回応用物理学会学術講演会講演予稿集 18a-ZC-8 1998
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD((]G0003[))
Kawara Yoshio, Kazuhiko Iwata, Isamu Kato
Extended Abstracts(The 59th Autumn Meeting, 1998) ; The Japan Society of Applied Physics 16p-ZE-16 1998
Influence of H2 Flow Rate on a-Si : H Film in Longitudinal Magnetic Field Applied to Coaxial Line Type MPCVD System
Masayuki Usuta, Hidenori Izuka, Kazuhiko Mori, Isamu Kato
Exterded Abstracts (The 59th Autumn Meeting, 1998) ; The Japan Society of Applied Physics 18a-ZC-8 1998
Fabrication of a-Si : H/SiN multilayer films by Double Tubed Coaxial Line Type MPCVD System
Syoji Kamigaichi, Naoyuki Iwata, Isamu Kato
Extended Abstracts(The 59th Autumn Meeting, 1998) ; The Japan Society of Applied Physics 15p-Z-6 1998
Control of Sheath Voltage in Double Tubed Coaxial Line Type MPCVD System
Masayuki Usuta, Hidenori Izuka, Kazuhiko Mori, Isamu Kato
Extended Abstracts(the 59th Autumn Meeting, 1998) ; The Japan Society of Applied Physics 18a-ZC-8 1998
Stabilization of Ar Plasma by Applying Longitudinal Magnetic Field
加藤勇, 山岸俊浩, 森田義則, 神子太郎
Electronics and Communications in Japan 81;3 1998
磁界印可型同軸線路形MPCVD装置におけるH2/SiH4プラズマを用いたa-Si:H膜の作製
臼田雅之, 飯塚英孝, 森和彦, 加藤勇
第45回応用物理学関係連合講演会／応用物理学会 30-p-H-13 1998
磁界印加型同軸線路形MPCVD装置におけるH2/SiH4プラズマを用いたa-Si:H膜の作製
臼田雅之, 飯塚英孝, 森和彦, 加藤勇
第45回応用物理学関係連合講演会講演予稿集 30p-H-13 1998
a-Si:H膜成長中のイオン衝撃効果について（Ⅱ）
岩田直之, 荻原博隆, 上垣内岳司, 加藤勇
第45回応用物理学関係連合講演会／応用物理学会 30a-SYK-5 1998
a-Si:H膜成長中のイオン衝撃効果について(3)
岩田直之, 荻原博隆, 上垣内岳司, 加藤勇
第45回応用物理学関係連合講演会講演予稿集 30a-SKY-5 1998
Si Luminescence Material Fabricated Using MPCVD Coaxial Line Type
Nobuyuki Koshiji, Kazuhiro Watanabe, Isamu Kato
Plasma Science Symposium 1998/The 15nd Symposium on Plasma Processing 2B1-1 1998
Fabrication of a-Si : H film Using H2/SiH4 Plasma in Magnetic Field Applied Coaxial Line Type MPCVD System
Masayuki Usui, Hidenori Izuka, Kazuhiko Mori, Isamu Kato
Extended Abstracts(The 45th Spring Meeting, 1998) ; The Japan Society of Applied Physics and Related Societies 30p-H-13 1998
Fabrication of a-Si : H Film Using H2/SiH4 Plasma by Longitudinal Magnetic Field Applied MPCVD System
Masayuki Usui, Hidenori Izuka, Kazuhiko Mori, Isamu Kato
Extended Abstracts(The 45th Spring Meeting, 1998) ; The Japan Society of Applied Physics and Related Societies 30-p-H-13 1998
Effect of Bombardment During a-Si : H Film Growth
Naoyuki Iwata, Hirotaka Ogiwara, Syoji Kamigaichi, Isamu Kato
Plasma Science Symposium 1998/The 14nd Symposium on Plasma Processing 1A3-1 1998
Si Luminescence Material Fabricated Using Coaxial Line Type MPCVD
越路信行, 渡部一博, 加藤勇
第15回プラズマプロセッシング研究会プロシーディングス／応用物理学会 2B1-1 1998
Fabrication of a-Si:H Film Using H2/SiH4 Plasma by Longitudinal Magnetic Field Applied MPCVD System
飯塚英孝, 臼田雅之, 加藤勇
第15回プラズマプロセッシング研究会プロシーディングス／応用物理学会 2C-42 1998
Effect of Ion Bombardment during a-si:H Film Growth
荻原博隆, 岩田直之, 加藤勇
第15回プラズマプロセッシング研究会プロシーディングス／応用物理学会 1A3-1 1998
Photo Luminescence from Si Films Fabricated by Double Tubed Coaxial Line Type Microwave Plasma CVD Apparatus
Isamu Kato, Yoshio Kawara
4TH INTERNATIONAL CONFERENCE ON REACTIVE PLASMAS AND 16TH SYMPOSIUM ON PLASMA PROCESSING Extended Abstracts EMP4.17 1998
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD((]G0003[))
Kawara Yoshio, Kazuhiko Iwata, Isamu Kato
Extended Abstracts(The 59th Autumn Meeting, 1998) ; The Japan Society of Applied Physics 16p-ZE-16 1998
Influence of H2 Flow Rate on a-Si : H Film in Longitudinal Magnetic Field Applied to Coaxial Line Type MPCVD System
Masayuki Usuta, Hidenori Izuka, Kazuhiko Mori, Isamu Kato
Exterded Abstracts (The 59th Autumn Meeting, 1998) ; The Japan Society of Applied Physics 18a-ZC-8 1998
Fabrication of a-Si : H/SiN multilayer films by Double Tubed Coaxial Line Type MPCVD System
Syoji Kamigaichi, Naoyuki Iwata, Isamu Kato
Extended Abstracts(The 59th Autumn Meeting, 1998) ; The Japan Society of Applied Physics 15p-Z-6 1998
Control of Sheath Voltage in Double Tubed Coaxial Line Type MPCVD System
Masayuki Usuta, Hidenori Izuka, Kazuhiko Mori, Isamu Kato
Extended Abstracts(the 59th Autumn Meeting, 1998) ; The Japan Society of Applied Physics 18a-ZC-8 1998
Si Luminescence Material Fabricated Using MPCVD Coaxial Line Type
Nobuyuki Koshiji, Kazuhiro Watanabe, Isamu Kato
Plasma Science Symposium 1998/The 15nd Symposium on Plasma Processing 2B1-1 1998
Fabrication of a-Si : H film Using H2/SiH4 Plasma in Magnetic Field Applied Coaxial Line Type MPCVD System
Masayuki Usui, Hidenori Izuka, Kazuhiko Mori, Isamu Kato
Extended Abstracts(The 45th Spring Meeting, 1998) ; The Japan Society of Applied Physics and Related Societies 30p-H-13 1998
Fabrication of a-Si : H Film Using H2/SiH4 Plasma by Longitudinal Magnetic Field Applied MPCVD System
Masayuki Usui, Hidenori Izuka, Kazuhiko Mori, Isamu Kato
Extended Abstracts(The 45th Spring Meeting, 1998) ; The Japan Society of Applied Physics and Related Societies 30-p-H-13 1998
Effect of Bombardment During a-Si : H Film Growth
Naoyuki Iwata, Hirotaka Ogiwara, Syoji Kamigaichi, Isamu Kato
Plasma Science Symposium 1998/The 14nd Symposium on Plasma Processing 1A3-1 1998
早大ハイテクリサーチセンター 第４プロジェクトフォトニクスと先端光子材料開発
加藤勇
科学新聞 1997
縦磁界印加によるArプラズマの安定化
加藤勇, 山岸俊浩, 森田義則, 神子太郎
電子情報通信学会論文誌／電子情報通信学会 J80-C-Ⅱ;11 1997
Silicon Oxynitride Waveguides for Optoelectronic Integrated Circuits
O.P.AGNIHOTRI, R.TYAGI, 加藤勇
応用物理学会論文誌／応用物理学会 36;11 1997
Stabilization of Ar Plasma by Applying Longitudinal Magnetic Field
Isamu Kato, Toshihiro Yamagishi, Kazuyoshi Motita, Taro Kamiko
Jpn. J. Appl. Phys J80-C-II/11,378-383 1997
二重管式同軸線路形MPCVD装置における水素プラズマへの磁界印加の効果（Ⅱ）
飯塚英孝, 臼田雅之, 加藤勇
第58回応用物理学会学術講演会／応用物理学会 4a-B-1 1997
a-Si:H膜成長中のイオン衝撃効果について（Ⅱ）
荻原博隆, 岩田直之, 加藤勇
第58回応用物理学会学術講演会／応用物理学会 3p-YD-8 1997
2重管式同軸線路型MPCVDを用いて作製したSi系発光材料の研究（Ⅱ）
越路信行, 加藤勇
第58回応用物理学会学術講演会／応用物理学会 2P-A-10 1997
The STudy of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD((]G0002[))
Nobuyuki Koshiji, Isamu Kato
Extended Abstracts(The 58th Autumn Meeting, 1997) ; The Japan Society of Applied Physics 2P-A-10 1997
Effect of Ion Bombardment during a-Si : H Film Growth((]G0002[))
Hirotaka Ogiwara, Naoyuki Iwata, Isamu Kato
Extended Abstracts(The 58th Autumn Meeting, 1997) ; The Japan Society of Applied Physics 3p-YD-8 1997
Effect of Applying Magnetic Field to H2 Plasma in Double Tubed Coaxial Line Type MPCVD System((]G0002[))
Hidenori Izuka, Masayuki Usui, Isamu Kato
Extended Abstracts(The 58th Autumn Meeting, 1997) ; The Japan Society of Applied Physics 4a-B-1 1997
二重管式同軸線路形MPCVD装置における水素プラズマへの磁界の効果
飯塚英孝, 臼田雅之, 小柴博貫, 神子太郎, 加藤勇
第44回応用物理学関係連合講演会／応用物理学会 29a-R-5 1997
二重管式同軸線路形MPCVDを用いて作製したSi系発光材料の研究
越路信行, 加藤勇
第44回応用物理学関係連合講演会／応用物理学会 30p-B-15 1997
同軸線路形MPCVD装置において印加磁界がN２プラズマに及ぼす効果(IV)
神子太郎, 榎本貴幸, 加藤勇
第44回応用物理学関係連合講演会／応用物理学会 29a-R-6 1997
縦磁界印加によるArプラズマの安定化
加藤勇, 山岸俊浩, 森田義則, 神子太郎
電子情報通信学会論文誌 J80-C-II ( 11 ) 378 - 383 1997
エバネッセント波を用いた放電停止後の半導体極薄膜表面変化のその場観測
竹沢永訓, 越路信行, 石田知則, 佐藤甲癸, 加藤勇
第44回応用物理学関係連合講演会／応用物理学会 28a-ZG-4 1997
a-Si:H膜成長中のイオン衝撃効果について
荻原博隆, 岩田直之, 加藤勇
第44回応用物理学関係連合講演会／応用物理学会 30p-ZE-17 1997
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD
Hirotaka Ogiwara, Naoyuki Iwata, Isamu Kato
Extended Abstracts(The 44th Spring Meeting, 1997) ; The Japan Society of Applied Physics and Related Societies 30p-B-15 1997
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System((]G0004[))
Taro Kamiko, Takayuki Enomoto, Isamu Kato
Extended Abstracts(The 44th Spring Meeting, 1997) ; The Japan Society of Applied Physics and Related Societies 29a-R-6 1997
Effects of Applying Magnetic Field to H2 Plasma in Double Tubed Coaxial Line Type MPCVD System
Hideyuki Izuka, Masayuki Usui, Hironuki Koshiba, Taro Kamiko, Isamu Kato
Extended Abstracts(The 44th Spring Meeting, 1997) ; The Japan Society of Applied Physics and Related Societies 29a-R-5 1997
Effect of Ion Bombardment during a-Si : H Film Growth
Koshiji Nobuyuki, Isamu Kato
Extended Abstracts(The 44th Spring Meeting, 1997) ; The Japan Society of Applied Physics and Related Societies 30p-ZE-17 1997
Refractive Index Measurement of Silicon Thin Films Using Optical Waveguides
竹沢永訓, 加藤勇, 野島信二
応用物理学会論文誌／応用物理学会 36;2 1997
In-situ Measurement of Optical Constant of Ultra Thin Films Using Optical Fiber Sensor
竹沢永訓, 加藤勇
The International Society for Optical Engineering／The Society of Photo-Optical Instrumentation Engineers 2997-50 1997
Refractive Index Measurement of Silicon Thin Films Using Slab Optical Waveguides
Naganori Takezawa, Isamu Kato, Shinji Nojiima
Jpn. J. Appl. Phys 36/2,920-925 1997
In situ Measurement of the Surface Change of Semiconductor Ultra Thin Films after Discharge Stop Using Evanescent Wave
E.Takezawa, Isamu Kato
The International Society for Optical Engineering／The Society of Photo-Optical Instrumentation Engineers 2997-50 1997
In situ Measurement of the Optical Constant of Ultra Thin Films Using Optical Fiber Sensor
Naganori Takezawa, Isamu Kato
SPIE Proceedings 2997/,355-361 1997
Separation of Film Surface Heating Effect and Ion Implanting Effect
荻原博隆, 飯塚英孝, 越路信行, 加藤勇
3rd International Conference on Reactive Plasmas. 14th Symposium on Plasma Processing IV-a-6 1997
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type of Micro Wave Plasma(IV)
神子太郎, 森田義則, 安藤維彦, 加藤勇
3rd International Conference on Reactive Plasmas，14th Symposium on Plasma Processing P3-12 1997
In situ Measurement of Change of Ultra Thin Films in Elapsed Time Using Optical Fiber sensors
竹沢永訓, 越路信行
3rd International Conference on Reactive Plasmas，14th Symposium on Plasma Processing P1-33 1997
Fabrication of SiN Film by Using Coaxal Line Type MPCVD System with Longitudinal Magnetic Field
応萱同, 森田義則, 神子太郎, 加藤勇
3rd International Conference on Reactive Plasmas，14th Symposium on Plasma Processing P1-31 1997
Silicon Oxynitride Waveguides for Optoelectronic Integrated Circuits
O.P.AGNIHOTRI, R.TYAGI, Isamu Kato
Jpn. J. Appl. Phys 36 ( 11 ) 6711 - 6713 1997
Stabilization of Ar Plasma by Applying Longitudinal Magnetic Field
Isamu Kato, Toshihiro Yamagishi, Kazuyoshi Motita, Taro Kamiko
Jpn. J. Appl. Phys J80-C-II/11,378-383 1997
The STudy of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD((]G0002[))
Nobuyuki Koshiji, Isamu Kato
Extended Abstracts(The 58th Autumn Meeting, 1997) ; The Japan Society of Applied Physics 2P-A-10 1997
Effect of Ion Bombardment during a-Si : H Film Growth((]G0002[))
Hirotaka Ogiwara, Naoyuki Iwata, Isamu Kato
Extended Abstracts(The 58th Autumn Meeting, 1997) ; The Japan Society of Applied Physics 3p-YD-8 1997
Effect of Applying Magnetic Field to H2 Plasma in Double Tubed Coaxial Line Type MPCVD System((]G0002[))
Hidenori Izuka, Masayuki Usui, Isamu Kato
Extended Abstracts(The 58th Autumn Meeting, 1997) ; The Japan Society of Applied Physics 4a-B-1 1997
The Study of Si Luminescence Material Fabricated Using the Double Tubed Coaxial Line Type MPCVD
Hirotaka Ogiwara, Naoyuki Iwata, Isamu Kato
Extended Abstracts(The 44th Spring Meeting, 1997) ; The Japan Society of Applied Physics and Related Societies 30p-B-15 1997
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System((]G0004[))
Taro Kamiko, Takayuki Enomoto, Isamu Kato
Extended Abstracts(The 44th Spring Meeting, 1997) ; The Japan Society of Applied Physics and Related Societies 29a-R-6 1997
Effects of Applying Magnetic Field to H2 Plasma in Double Tubed Coaxial Line Type MPCVD System
Hideyuki Izuka, Masayuki Usui, Hironuki Koshiba, Taro Kamiko, Isamu Kato
Extended Abstracts(The 44th Spring Meeting, 1997) ; The Japan Society of Applied Physics and Related Societies 29a-R-5 1997
Effect of Ion Bombardment during a-Si : H Film Growth
Koshiji Nobuyuki, Isamu Kato
Extended Abstracts(The 44th Spring Meeting, 1997) ; The Japan Society of Applied Physics and Related Societies 30p-ZE-17 1997
Refractive Index Measurement of Silicon Thin Films Using Slab Optical Waveguides
Naganori Takezawa, Isamu Kato, Shinji Nojiima
Jpn. J. Appl. Phys 36/2,920-925 1997
In situ Measurement of the Surface Change of Semiconductor Ultra Thin Films after Discharge Stop Using Evanescent Wave
E.Takezawa, Isamu Kato
The International Society for Optical Engineering／The Society of Photo-Optical Instrumentation Engineers 2997-50 1997
In-situ measurement of the optical constant of ultrathin films using optical fiber sensor
Naganori Takezawa, Isamu Kato
Proceedings of SPIE - The International Society for Optical Engineering 2997 355 - 361 1997
Silicon Oxynitride Waveguides for Optoelectronic Integrated Circuits
O.P.AGNIHOTRI, R.TYAGI, Isamu Kato
Jpn. J. Appl. Phys 36 ( 11 ) 6711 - 6713 1997
Simulation of Coaxial Line Type Microwave Plasma((]G0003[))
Hidenori Izuka, Taro Kamiko, Yoshinori Morita, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 7p-KE-8 1996
Photoluminescence of a-Si-H films in MPCVD((]G0002[))
Nobuyuki Koshiji, Hirotaka Ogiwara, K.Sato, Katsuyuki Utaka,and, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 8p-ZR-17 1996
In situ Measurement of the Surface Change of Semiconductor Ultra Thin Films after Leak Using Evanescent Wave
Naganori Takezawa, Nobuyuki Koshiji, K.Sato, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 7a-A-1 1996
Fabrication of SiN Films by Using Coaxial Line Type Microwave Plasma CVD System with Longitudinal Magnetic Field
Yoshinori Morita, Taro Kamiko, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 9a-ZQ-11 1996
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System((]G0003[))
Taro Kamiko, Yoshinori Morita, Tsuguhiko Ando, Naganori Takezawa, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 7p-C-15 1996
Effect of Ion Bombardment on Film Properties of a-Si : H in MPCVD
Hirotaka Ogiwara, Nobuyuki Koshiji, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 9a-ZQ-6 1996
Characteristics of Coaxial Line type Microwave H2 Plasma
Hidenori Izuka, Taro Kamiko, Yoshinori Morita, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 7p-C-16 1996
同軸線路形マイクロ波プロズマのシュミレーション(3)
安藤維彦, 神子太郎, 森田義則, 加藤勇
第57回応用物理学会学術講演会講演予稿集 7p-KE-8 1996
同軸線路形マイクロ波プラズマ発生装置の基礎特性
飯塚英孝, 神子太郎, 森田義則, 加藤勇
第57回応用物理学会学術講演会講演予稿集 7p-C-16 1996
同軸線路形MPCVD装置において印加磁界がN2プラズマに及ぼす効果(3)
神子太郎, 森田義則, 安藤維彦, 竹沢永訓, 加藤勇
第57回応用物理学会学術講演会講演予稿集 7p-C-15 1996
縦磁界印加同軸線路形マイクロ波デバイスCVDによるSiN膜の作製
森田義則, 神子太郎, 加藤勇
第57回応用物理学会学術講演会講演予稿集 9a-ZQ-11 1996
エバネッセント波を用いたリーク後の半導体極薄膜表面変化のその場観測
竹沢永訓, 越路信行, 佐藤甲癸, 加藤勇
第57回応用物理学会学術講演会講演予稿集 7a-A-1 1996
MPCVDにおけるa-Si:H膜質に与えるイオン衝撃の効果
荻原博隆, 越路信行, 加藤勇
第57回応用物理学会学術講演会講演予稿集 9a-ZQ-6 1996
MPCVDにおけるa-Si:H膜のフォトルミネッセンス(2)
越路信行, 荻原博隆, 佐藤甲癸, 宇高勝之, 加藤勇
第57回応用物理学会学術講演会講演予稿集 8p-ZR-17 1996
二重管式同軸線路形マイクロ波プラズマCVDにおけるN2/SiH4プラズマのパラメータの空間分布
加藤勇, 下田毅, 山岸俊浩
電気学会論文誌 116-A ( 7 ) 617 - 622 1996
Spatial Distribution of Plasma Paramerter in N2/SiH4 Plasma in Double Tubed Coaxial Line Type Microwave Plasma CVD System
Isamu Kato, Tsuyoshi Shimoda, Yamagishi Toshihiro
The International Society for Optical Engineering 116-A/7,617-622 1996
RFバイアス印加同軸線路形マイクロ波プラズマCVDによるSiN膜の低温作製
森田義則, 加藤勇, 中嶋達司
電子情報通信学会論文誌／電子情報通信学会 J79-C-II;6 1996
RFバイアス印加同軸線路形マイクロ波プラズマCVDによるSiN膜の低温作製
森田義則, 加藤勇, 中嶋達司
電子情報通信学会論文誌 J79-C-II ( 6 ) 303 - 310 1996
Fabrication of SiN Films at Low Temperature Using RF Biased Coaxial-Line Type Microwave Plasma CVD
Yoshinori Morita, Isamu Kato, Tatsuji Nagajima
J79-C-II/6,303-310 1996
Dependence of Plasma Parameters on Electric Potential of Electrode in Microwave Plasma
Yoshinori Morita, Isamu Kato, Tatsuji Nagajima
Electronics and Communications in Japan 79/5,58-65 1996
Optical Energy Gap Measurement of Semiconductor Ultrathin Films Using Optical Waveguides
竹沢永訓, 加藤勇
応用物理学会論文誌／応用物理学会 35-5A 1996
Dependence of Plasma Parameters on Electric Potential of Electrode in Microwave Plasma
加藤勇, 松下亨, 山下真
電子情報通信学会論文誌／電子情報通信学会 79;5 1996
Optical Energy Gap Measurement of Semiconductor Ultrathin Films Using Optical Waveguide
Naganori Takezawa, Isamu Kato
Jpn.J.Appl.Phys. 35 ( 5A ) 2826 - 2832 1996
Optical Energy Gap Measurement of Semiconductor Ultra Thin Films Using Optical Fibers
Naganori Takezawa, Isamu Kato
Jpn J Appl Phys 35 ( 5A ) 2826 - 2832 1996
Dependence of Plasma Parameters on Electric Potential of Electrode in Microwave Plasma
Isamu Kato, Toshiyuki Yoneda, Toru Matsushita, Makoto Yamashita
Jpn.J.Appl.Phys. J79-C-II/1,1-7 1996
無イオン衝撃作製のa-Si:H膜質の基板温度依存性
荻原博隆, 山下真, 飯塚英孝, 越路信行, 加藤勇
第43回応用物理学関係連合講演会/応用物理学会 26a-STF-13 1996
同軸線路形マイクロ波プラズマのシミュレーション（II）
安藤維彦, 山岸俊浩, 神子太郎, 森田義則, 加藤勇
第43回応用物理学関係連合講演会/応用物理学会 28p-B-4 1996
同軸線路形MPCVD装置において印加磁界がN2プラズマに及ぼす効果（II）
神子太郎, 山岸俊浩, 森田義則, 加藤勇
第43回応用物理学関係連合講演会/応用物理学会 28a-SZM-14 1996
同軸線路形MPCVD装置において印加磁界がArプラズマに及ぼす影響（IV）
山岸俊浩, 神子太郎, 森田義則, 加藤勇
第43回応用物理学関係連合講演会/応用物理学会 28a-SZM-15 1996
窒素ガス流量がSiN膜の膜特性に与える影響（II）
森田義則, 加藤勇
第43回応用物理学関係連合講演会/応用物理学会 26a-STF-28 1996
光ファイバーを用いた半導体薄膜の光学的エネルギーギャップの測定
竹沢永訓, 佐藤甲癸, 加藤勇
第43回応用物理学関係連合講演会/応用物理学会 27a-STF-7 1996
MPCVD法によって作製されたa-Si:H膜のフォトルミネッセンス
野島信二, 山下真, 林錫梹, 加藤勇
第43回応用物理学関係連合講演会/応用物理学会 27a-TC-5 1996
Simulation of Coaxial Line Type Microwave Plasma((]G0002[))
Tsuguhiko Ando, Toshihiro Yamagishi, Taro Kamiko, Yoshinori Morita, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 28p-B-4 1996
Photoluminescence of a-Si : H films fabricated by MPCVD
Shinji Nojima, Makoto, Yamashita,H.Hayashi, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 27a-TC-5 1996
Influence of N2 Gas Flow Rate on Film Properties of SiN Film((]G0002[))
Hirotaka Ogiwara, Makoto Yamashita, Hidenori Izuka, Nobuyuki Tsukaji, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 26a-STF-28 1996
Influence of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System((]G0002[))
Taro Kamiko, Toshihiro Yamagishi, Kazuyoshi Morita, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 28a-SZM-14 1996
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD(System((]G0002[))
Toshihiro Yamagishi, Taro Kamiko, Kazuyoshi Morita, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 28a-SZM-15 1996
Dependence of Film Properties of a-Si : H fabricated without Ion Bombardment on Substrate Temperature
Hirotaka Ogiwara, Nobuyuki Koshiji, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 26a-STF-13 1996
マイクロ波プラズマ中に設置した電極の電位がプラズマパラメータに与える影響
加藤勇, 松下亨, 山下真
電子情報通信学会論文誌/電子情報通信学会 J79-C-II;1 1996
マイクロ波プラズマ中に設置した電極の電位がプラズマパラメータに与える影響
加藤勇, 松下亨, 山下真
電子情報通信学会論文誌 J79-C-II ( 1 ) 1 - 7 1996
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave Plasma(III)
山岸俊浩, 神子太郎, 森田義則, 加藤勇
第13回プラズマプロセシング研究会プロシーディングス/応用物理学会 1A1-4 1996
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave Plasma (II)
神子太郎, 山岸俊浩, 森田義則, 加藤勇
第13回プラズマプロセシング研究会プロシーディングス/応用物理学会 2C-C 1996
Film Deposition under Control of Sheath Voltage on the Film Surface in MPCVD Apparatus
山下真, 荻原博隆, 加藤勇
第13回プラズマプロセシング研究会プロシーディングス/応用物理学会 1B3-3 1996
Infuence of Longitudinal Magnetic Field Applied to Coxial Line Type Microwave Prasma((]G0003[))
Toshihiro Yamagishi, Taro Kamiko, Kazuyoshi Morita, Isamu Kato
Plasma Science Symposium 1996/The 12nd Symposium on Plasma Processing 2C-C/,175-178 1996
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave Plasma((]G0002[))
Taro Kamiko, Toshihiro Yamagishi, Kazuyoshi Morita, Isamu Kato
Plasma Science Symposium 1996/The 12nd Symposium on Plasma Processing 1A-4/,13-16 1996
Film Deposition under Control of Sheath Voltage on the Film Surface in MPCVD Apparatus
Makoto Yamashita, Hirotaka Ogiwara, Isamu Kato
Plasma Science Symposium 1996/The 12nd Symposium on Plasma Processing 1B3-3/,109-112 1996
Simulation of Coaxial Line Type Microwave Plasma((]G0003[))
Hidenori Izuka, Taro Kamiko, Yoshinori Morita, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 7p-KE-8 1996
Photoluminescence of a-Si-H films in MPCVD((]G0002[))
Nobuyuki Koshiji, Hirotaka Ogiwara, K.Sato, Katsuyuki Utaka,and, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 8p-ZR-17 1996
In situ Measurement of the Surface Change of Semiconductor Ultra Thin Films after Leak Using Evanescent Wave
Naganori Takezawa, Nobuyuki Koshiji, K.Sato, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 7a-A-1 1996
Fabrication of SiN Films by Using Coaxial Line Type Microwave Plasma CVD System with Longitudinal Magnetic Field
Yoshinori Morita, Taro Kamiko, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 9a-ZQ-11 1996
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System((]G0003[))
Taro Kamiko, Yoshinori Morita, Tsuguhiko Ando, Naganori Takezawa, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 7p-C-15 1996
Effect of Ion Bombardment on Film Properties of a-Si : H in MPCVD
Hirotaka Ogiwara, Nobuyuki Koshiji, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 9a-ZQ-6 1996
Characteristics of Coaxial Line type Microwave H2 Plasma
Hidenori Izuka, Taro Kamiko, Yoshinori Morita, Isamu Kato
Extended Abstracts(The 57th Autumn Meeting, 1996) ; The Japan Society of Applied Physics 7p-C-16 1996
Spatial Distribution of Plasma Paramerter in N2/SiH4 Plasma in Double Tubed Coaxial Line Type Microwave Plasma CVD System
Isamu Kato, Tsuyoshi Shimoda, Yamagishi Toshihiro
The International Society for Optical Engineering 116-A/7,617-622 1996
Fabrication of SiN Films at Low Temperature Using RF Biased Coaxial-Line Type Microwave Plasma CVD
Yoshinori Morita, Isamu Kato, Tatsuji Nagajima
J79-C-II/6,303-310 1996
Dependence of Plasma Parameters on Electric Potential of Electrode in Microwave Plasma
Yoshinori Morita, Isamu Kato, Tatsuji Nagajima
Electronics and Communications in Japan 79/5,58-65 1996
Optical Energy Gap Measurement of Semiconductor Ultrathin Films Using Optical Waveguide
Naganori Takezawa, Isamu Kato
Jpn.J.Appl.Phys. 35 ( 5A ) 2826 - 2832 1996
Optical Energy Gap Measurement of Semiconductor Ultra Thin Films Using Optical Fibers
Naganori Takezawa, Isamu Kato
Jpn J Appl Phys 35 ( 5A ) 2826 - 2832 1996
Dependence of Plasma Parameters on Electric Potential of Electrode in Microwave Plasma
Isamu Kato, Toshiyuki Yoneda, Toru Matsushita, Makoto Yamashita
Jpn.J.Appl.Phys. J79-C-II/1,1-7 1996
Simulation of Coaxial Line Type Microwave Plasma((]G0002[))
Tsuguhiko Ando, Toshihiro Yamagishi, Taro Kamiko, Yoshinori Morita, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 28p-B-4 1996
Photoluminescence of a-Si : H films fabricated by MPCVD
Shinji Nojima, Makoto, Yamashita,H.Hayashi, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 27a-TC-5 1996
Influence of N2 Gas Flow Rate on Film Properties of SiN Film((]G0002[))
Hirotaka Ogiwara, Makoto Yamashita, Hidenori Izuka, Nobuyuki Tsukaji, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 26a-STF-28 1996
Influence of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System((]G0002[))
Taro Kamiko, Toshihiro Yamagishi, Kazuyoshi Morita, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 28a-SZM-14 1996
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD(System((]G0002[))
Toshihiro Yamagishi, Taro Kamiko, Kazuyoshi Morita, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 28a-SZM-15 1996
Dependence of Film Properties of a-Si : H fabricated without Ion Bombardment on Substrate Temperature
Hirotaka Ogiwara, Nobuyuki Koshiji, Isamu Kato
Extended Abstracts(The 43th Spring Meeting, 1996) ; The Japan Society of Applied Physics and Related Societies 26a-STF-13 1996
Infuence of Longitudinal Magnetic Field Applied to Coxial Line Type Microwave Prasma((]G0003[))
Toshihiro Yamagishi, Taro Kamiko, Kazuyoshi Morita, Isamu Kato
Plasma Science Symposium 1996/The 12nd Symposium on Plasma Processing 2C-C/,175-178 1996
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave Plasma((]G0002[))
Taro Kamiko, Toshihiro Yamagishi, Kazuyoshi Morita, Isamu Kato
Plasma Science Symposium 1996/The 12nd Symposium on Plasma Processing 1A-4/,13-16 1996
Film Deposition under Control of Sheath Voltage on the Film Surface in MPCVD Apparatus
Makoto Yamashita, Hirotaka Ogiwara, Isamu Kato
Plasma Science Symposium 1996/The 12nd Symposium on Plasma Processing 1B3-3/,109-112 1996
Refractive indices of a-Si : H films by double-tubed coaxial line type MPCVD at Long Wave Length Region
Shinji Nojima, Makoto Yamashita, Kazushike Horita, Katsuyuki Utaka, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 26a-SP-24 1995
Measurement of infrared absorption spectrum in thin a-SiH films using an optical waveguide
Kazushige Horita, Naganori Kakezawa, Shinji Nojima, K.Sato, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 27a-N-3 1995
Infuence of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System((]G0003[))
Toshihiro Yamagishi, Taro Kamiko, Kazuyoshi Morita, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 27p-M-9 1995
Effects of RF Bias on Microwave Plasma
Kazuyoshi Morita, Tatsuji Nakajima, Toshihiro Yamagisi, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 28a-ZD-8 1995
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System
Taro Kamiko, Toshihiro Yamagishi, Kazuyoshi Morita, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 27p-M-10 1995
Control of Ion Bombardment Energy in MPCVD
Makoto Yamashita, Hirotaka Ogiwara, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 28a-ZD-7 1995
同軸線路形マイクロ波プラズマのシミュレーション
和井田祐一, 山岸俊浩, 森田義則, 神子太郎, 加藤勇
第56回応用物理学会学術講演会/応用物理学会 27a-K-3 1995
同軸線路形MPCVD装置において印加磁界がN2プラズマに及ぼす影響
神子太郎, 山岸俊浩, 森田義則, 加藤勇
第56回応用物理学会学術講演会/応用物理学会 27p-M-10 1995
同軸線路形MPCVDにおいて印加磁界がArプラズマに及ぼす影響（III）
山岸俊浩, 森田義則, 神子太郎, 加藤勇
第56回応用物理学会学術講演会/応用物理学会 27p-M-9 1995
光導波路を用いたa-Si:H薄膜の赤外吸収スペクトル測定
堀田和重, 竹沢永訓, 野島信二, 佐藤甲癸, 加藤勇
第56回応用物理学会学術講演会/応用物理学会 27a-N-3 1995
マイクロ波プラズマにおけるRFバイアス印加効果
森田義則, 中嶋達司, 山岸俊浩, 加藤勇
第56回応用物理学会学術講演会/応用物理学会 28a-ZD-8 1995
MPCVDにおけるイオン衝撃エネルギーの制御
山下真, 荻原博隆, 加藤勇
第56回応用物理学会学術講演会/応用物理学会 28a-ZD-7 1995
2重管式同軸線路形MPCVDによるa-Si:H膜の長波長帯における屈折率測定
野島信二, 山下真, 堀田和重, 宇高勝之, 加藤勇
第56回応用物理学会学術講演会/応用物理学会 26a-SP-24 1995
マイクロ波プラズマCVDにおけるラジカル種の制御
加藤勇, 米田俊之, 松下亨, 山下真
電子情報通信学会論文誌/電子情報通信学会 J78-C-II;4 1995
Control of Radical Species in Microwave Plasma CVD
Isamu Kato, Toshiyuki Yoneda, Toru Matsushita, Makoto Yamashita
Jpn.J.Appl.Phys. J78-C-II/4,142-148 1995
半導体膜装荷時の光導波路における透過率の装荷膜厚依存性
竹沢永訓, 堀田和重, 野島信二, 佐藤甲癸, 加藤勇
電子情報通信学会 C-269 1995
内管の電位がプラズマパラメータと膜質に与える影響
山下真, 松下亨, 荻原博隆, 田中幹朗, 加藤勇
応用物理学会 (]G0001[)B07/,67-70 1995
マイクロ波プラズマCVDにおけるラジカル種の制御
加藤勇, 米田俊之, 松下亨, 山下真
電子情報通信学会論文誌 J78-C-II ( 4 ) 142 - 148 1995
スラブ光導波路を用いた装荷薄膜の屈折率測定
野島信二, 竹沢永訓, 堀田和重, 加藤勇
電子情報通信学会 C-270 1995
RFバイアス印加同軸線路形MPCVDによるSiN膜の作製
森田義則, 中嶋達司, 相川満男, 加藤勇
第42回応用物理学関係連合講演会講演予稿集 31a-E-7 1995
MPCVDにおける内管の電位が膜質に与える影響
山下真, 松下亨, 荻原博隆, 田中幹朗, 加藤勇
第42回応用物理学関係連合講演会講演予稿集 30p-L-9 1995
Influence of Applying Magnetic Field to Ar Plama in Coaxial Line Type MPCVD System((]G0002[))
Toshihiro Yamajishi, Kazuyoshi Morita, Taro Kamiko, Isamu Kato
Extended Abstracts(The 42th Spring Meeting, 1995) ; The Japan Society of Applied Physics and Related Societies 28a-TE-1 1995
Fabrication of SiN Films by Using RF Biased Coaxial Line Type MPCVD
Kazuyoshi Morita, Tatsuji Nakajima, Mitsuo Aikawa, Isamu Kato
Extended Abstracts(The 42th Spring Meeting, 1995) ; The Japan Society of Applied Physics and Related Societies 31a-E-7 1995
Dependence of Film Properties on Electric Potential of Inner Tube in MPCVD
Toru Matsushita, Makoto Yamashita, Hirotaka Ogiwara, Mikiro Tanaka, Isamu Kato
Extended Abstracts(The 42th Spring Meeting, 1995) ; The Japan Society of Applied Physics and Related Societies 30p-L-9 1995
Refractive Index Measurement of MPCVD Thin Films Using Slab Wave Guide
Shinji Nojima, Naganori Takezawa, Kazushige Horita, Isamu Kato
Jpn J Appl Phys (]G0002[)c35/,325-328 1995
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave
Toshihiro Yamagishi, Kazuyoshi Motita, Isamu Kato
Jpn J Appl Phys (]G0001[)A06/,43-46 1995
Fabrication of SiN Film By Using MpCVD System with Longitudinal Magnetic Field
Kenichi Hiraki, Kazuyoshi Morita, Toshihiro Yamagishi, Isamu Kato
Jpn J Appl Phys (]G0003[)B07/,497-500 1995
Dependence of Plasma Parameters and Film Properties on Electric Potential of Inner Tube
Makoto Yamashita, Toru Matsushita, Hirotaka Ogiwara, Mikiro Tanaka, Isamu Kato
Jpn J Appl Phys (]G0001[)B07/,67-70 1995
Refractive indices of a-Si : H films by double-tubed coaxial line type MPCVD at Long Wave Length Region
Shinji Nojima, Makoto Yamashita, Kazushike Horita, Katsuyuki Utaka, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 26a-SP-24 1995
Measurement of infrared absorption spectrum in thin a-SiH films using an optical waveguide
Kazushige Horita, Naganori Kakezawa, Shinji Nojima, K.Sato, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 27a-N-3 1995
Infuence of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System((]G0003[))
Toshihiro Yamagishi, Taro Kamiko, Kazuyoshi Morita, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 27p-M-9 1995
Effects of RF Bias on Microwave Plasma
Kazuyoshi Morita, Tatsuji Nakajima, Toshihiro Yamagisi, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 28a-ZD-8 1995
Effects of Applying Magnetic Field to N2 Plasma in Coaxial Line Type MPCVD System
Taro Kamiko, Toshihiro Yamagishi, Kazuyoshi Morita, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 27p-M-10 1995
Control of Ion Bombardment Energy in MPCVD
Makoto Yamashita, Hirotaka Ogiwara, Isamu Kato
Extended Abstracts(The 56th Autumn Meeting, 1995) ; The Japan Society of Applied Physics 28a-ZD-7 1995
Control of Radical Species in Microwave Plasma CVD
Isamu Kato, Toshiyuki Yoneda, Toru Matsushita, Makoto Yamashita
Jpn.J.Appl.Phys. J78-C-II/4,142-148 1995
Influence of Applying Magnetic Field to Ar Plama in Coaxial Line Type MPCVD System((]G0002[))
Toshihiro Yamajishi, Kazuyoshi Morita, Taro Kamiko, Isamu Kato
Extended Abstracts(The 42th Spring Meeting, 1995) ; The Japan Society of Applied Physics and Related Societies 28a-TE-1 1995
Fabrication of SiN Films by Using RF Biased Coaxial Line Type MPCVD
Kazuyoshi Morita, Tatsuji Nakajima, Mitsuo Aikawa, Isamu Kato
Extended Abstracts(The 42th Spring Meeting, 1995) ; The Japan Society of Applied Physics and Related Societies 31a-E-7 1995
Dependence of Film Properties on Electric Potential of Inner Tube in MPCVD
Toru Matsushita, Makoto Yamashita, Hirotaka Ogiwara, Mikiro Tanaka, Isamu Kato
Extended Abstracts(The 42th Spring Meeting, 1995) ; The Japan Society of Applied Physics and Related Societies 30p-L-9 1995
Refractive Index Measurement of MPCVD Thin Films Using Slab Wave Guide
Shinji Nojima, Naganori Takezawa, Kazushige Horita, Isamu Kato
Jpn J Appl Phys (]G0002[)c35/,325-328 1995
Influence of Longitudinal Magnetic Field Applied to Coaxial Line Type Microwave
Toshihiro Yamagishi, Kazuyoshi Motita, Isamu Kato
Jpn J Appl Phys (]G0001[)A06/,43-46 1995
Fabrication of SiN Film By Using MpCVD System with Longitudinal Magnetic Field
Kenichi Hiraki, Kazuyoshi Morita, Toshihiro Yamagishi, Isamu Kato
Jpn J Appl Phys (]G0003[)B07/,497-500 1995
Dependence of Plasma Parameters and Film Properties on Electric Potential of Inner Tube
Makoto Yamashita, Toru Matsushita, Hirotaka Ogiwara, Mikiro Tanaka, Isamu Kato
Jpn J Appl Phys (]G0001[)B07/,67-70 1995
Influence of DC Bias and Area of Substrate Table on Concentration of SiH in Plasma CVD Method
Isamu Kato, Toshiyuki Yoneda, Toru Matsushita
Jpn. J. Appl. Phys. 114-A/10,718-722 1994
プラズマCVDによって作製されたa-Si:H膜に与えるイオン衝撃の影響
加藤勇, 米田俊之, 松下亨
電子情報通信学会論文誌 J77-C-II ( 9 ) 384 - 391 1994
Refractive Index Measurement of Thin Films Using a Slab Waveguide
Naganori Takezawa, Shinji Nojima, Kazushige Horita, K.Sato, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-A-14 1994
Optical Energy Gap Measurement of Semiconductor Ultra Thin Films Using a Slab Waveguide((]G0003[))
Naganori Takezawa, Kazushige Horita, K.Sato, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-A-12 1994
Influence of N2 Gas Flow Rate on Film Properties of Sin Film
Yoshinori Morita, Tatsuji Nakashima, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-N-13 1994
Influence of Ion Bombardment on A-Si : H Films Fabricated by Plasma CVD
Isamu Kato, Toshiyuki Yoneda, Toru Matsushita
Jpn. J. Appl. Phys. J77-C-II/9,384-391 1994
Influence of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System
Toshihiro Yamagiji, Kazunori Morita, Eiji Honma, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 19p-ZV-15 1994
Fabrication of a-Si : H Film by MPCVD System with Longitudinal Magnetic Field
Makoto Yamashita, Toru Matsusita, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 20p-ZH-12 1994
Dependence on Properties of SiN Films on End Position of Inner Tube in Double Tube Coaxial Line Type MPCVD System
Isamu Kato, Kazutomi Mori, K.Sato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-N-12 1994
Dependence of the Film Properties of a-Si : H on Substrate Temperature in MPCVD
Toru Matsusita, Makoto Yamashita, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 20p-ZH-9 1994
Analysis of Oscillation of Transmittance on Slab Waveguide with Semiconductor Thin Films
Kazushige Horita, Naganori Takezawa, K.Sato, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-A-13 1994
Removal Conditions of Films Deposited on Probe Surface
Isamu Kato, Tsuyoshi Shimoda, Toshihiro Yamagishi
Jpn. J. Appl. Phys. 33 ( 6A ) 3586 - 3589 1994
Removal Condition of Films Deposited on Probe Surface
Isamu Kato, Tsuyoshi Shimoda, Toshihiro Yamagishi
Jpn. J. Appl. Phys. 33 ( 6A ) 3586 - 3589 1994
平板光導波路を用いた半導体極薄膜の光学エネルギーギャップの測定(3)
竹沢永訓, 堀田和重, 佐藤甲癸, 加藤勇
第55回応用物理学会学術講演会講演予稿集 21p-A-12 1994
平板光導波路を用いた薄膜の屈折率の測定
竹沢永訓, 野島信二, 堀田和重, 佐藤甲癸, 加藤勇
第55回応用物理学会学術講演会講演予稿集 21p-A-14 1994
半導体薄膜装荷平板光導波路における透過率の振動の解析
堀田和重, 竹沢永訓, 佐藤甲癸, 加藤勇
第55回応用物理学会学術講演会講演予稿集 21p-A-13 1994
二重管式同軸線路形MPCVD装置におけるトiN膜の膜質の内管端位置依存性
中島達司, 森田義則, 平木健一, 加藤勇
第55回応用物理学会学術講演会講演予稿集 21p-N-12 1994
同軸線路形MPCVD装置において印加磁界がArプラズマに及ぼす影響
山岸俊浩, 森田義則, 本間英二, 加藤勇
第55回応用物理学会学術講演会予稿集 19p-ZV-15 1994
窒素ガス流量がSiN膜の膜特性に与える影響
森田義則, 中島達司, 加藤勇
第55回応用物理学会学術講演会講演予稿集 21p-N-13 1994
縦方向磁界印加MPCVD装置によるa-Si:H膜の作製
山下真, 松下亨, 加藤勇
第55回応用物理学会学術講演会講演予稿集 20p-ZH-12 1994
MPCVDにおけるa-Si:Hの膜質の基板温度依存性
松下亨, 山下真, 加藤勇
第55回応用物理学会学術講演会講演予稿集 20p-ZH-9 1994
Optical Energy Gap Measurement of Semiconductor Films using an Optical Waveguide
Naganori Takezawa, Kazushige Horita, K.Sato, Isamu Kato
Proceedings of the International Seminar on Reactive Plasmas(ICRP) Xc-17/,689-692 1994
High Rate Deposition of a-Si : H Films by Coaxial Line Type MPCVD System
Toshihiro Yamagiji, Kazunori Morita, Eiji Honma, Isamu Kato
Proceedings of the International Seminar on Reactive Plasmas(ICRP) Xc-3/,633-636 1994
Fabrication of SiN Films on Magnetic Tape For Protective Film by Coaxial Line Type MPCVD System
Yoshinori Morita, Tatsuji Nakashima, Isamu Kato
Proceedings of the International Seminar on Reactive Plasms(ICRP) Xc-9/,657-660 1994
Influence of DC Bias and Area of Substrate Table on Concentration of SiH in Plasma CVD Method
Isamu Kato, Toshiyuki Yoneda, Toru Matsushita
Jpn. J. Appl. Phys. 114-A/10,718-722 1994
Refractive Index Measurement of Thin Films Using a Slab Waveguide
Naganori Takezawa, Shinji Nojima, Kazushige Horita, K.Sato, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-A-14 1994
Optical Energy Gap Measurement of Semiconductor Ultra Thin Films Using a Slab Waveguide((]G0003[))
Naganori Takezawa, Kazushige Horita, K.Sato, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-A-12 1994
Influence of N2 Gas Flow Rate on Film Properties of Sin Film
Yoshinori Morita, Tatsuji Nakashima, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-N-13 1994
Influence of Ion Bombardment on A-Si : H Films Fabricated by Plasma CVD
Isamu Kato, Toshiyuki Yoneda, Toru Matsushita
Jpn. J. Appl. Phys. J77-C-II/9,384-391 1994
Influence of Applying Magnetic Field to Ar Plasma in Coaxial Line Type MPCVD System
Toshihiro Yamagiji, Kazunori Morita, Eiji Honma, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 19p-ZV-15 1994
Fabrication of a-Si : H Film by MPCVD System with Longitudinal Magnetic Field
Makoto Yamashita, Toru Matsusita, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 20p-ZH-12 1994
Dependence on Properties of SiN Films on End Position of Inner Tube in Double Tube Coaxial Line Type MPCVD System
Isamu Kato, Kazutomi Mori, K.Sato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-N-12 1994
Dependence of the Film Properties of a-Si : H on Substrate Temperature in MPCVD
Toru Matsusita, Makoto Yamashita, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 20p-ZH-9 1994
Analysis of Oscillation of Transmittance on Slab Waveguide with Semiconductor Thin Films
Kazushige Horita, Naganori Takezawa, K.Sato, Isamu Kato
Extended Abstracts(The 55th Autumn Meeting, 1994) ; The Japan Society of Applied Physics 21p-A-13 1994
Removal Conditions of Films Deposited on Probe Surface
Isamu Kato, Tsuyoshi Shimoda, Toshihiro Yamagishi
Jpn. J. Appl. Phys. 33 ( 6A ) 3586 - 3589 1994
Removal Condition of Films Deposited on Probe Surface
Isamu Kato, Tsuyoshi Shimoda, Toshihiro Yamagishi
Jpn. J. Appl. Phys. 33 ( 6A ) 3586 - 3589 1994
Optical Energy Gap Measurement of Semiconductor Films using an Optical Waveguide
Naganori Takezawa, Kazushige Horita, K.Sato, Isamu Kato
Proceedings of the International Seminar on Reactive Plasmas(ICRP) Xc-17/,689-692 1994
METHOD OF PROBE MEASUREMENT IN N-2/SIH4 MICROWAVE PLASMA
KATO, I, T SAKAMOTO, T SHIMODA
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 33 ( 1A ) 307 - 310 1994.01
High Rate Deposition of a-Si : H Films by Coaxial Line Type MPCVD System
Toshihiro Yamagiji, Kazunori Morita, Eiji Honma, Isamu Kato
Proceedings of the International Seminar on Reactive Plasmas(ICRP) Xc-3/,633-636 1994
Fabrication of SiN Films on Magnetic Tape For Protective Film by Coaxial Line Type MPCVD System
Yoshinori Morita, Tatsuji Nakashima, Isamu Kato
Proceedings of the International Seminar on Reactive Plasms(ICRP) Xc-9/,657-660 1994
Optical Energy Gap Measurement of Plasma chemical Vapor Deposition Very Thin Films Using Evanescent Wave
Naganori Takezawa, Isamu Kato
Jpn. J. Appl. Phys. 32,2/10A,L1474-L1476 1993
Removal Conditions of Films Deposited on Probe
Tadashi Sakamoto, Isamu Kato
Proceedings of the International Seminar on Reactive Plasmas(ICRP) VIIb-9/,179-182 1993
Ion Bombertment Effects Under MPCVD of a-Si : H Film
Takashi Go, Masataka Kato, Isamu Kato
Jpn. J. Appl. Phys. V-4/,97-100 1993
Optical Energy Gap Measurement of Plasma chemical Vapor Deposition Very Thin Films Using Evanescent Wave
Naganori Takezawa, Isamu Kato
Jpn. J. Appl. Phys. 32,2/10A,L1474-L1476 1993
Removal Conditions of Films Deposited on Probe
Tadashi Sakamoto, Isamu Kato
Proceedings of the International Seminar on Reactive Plasmas(ICRP) VIIb-9/,179-182 1993
Ion Bombertment Effects Under MPCVD of a-Si : H Film
Takashi Go, Masataka Kato, Isamu Kato
Jpn. J. Appl. Phys. V-4/,97-100 1993
SiN膜装荷による薄膜導波形偏光素子
加藤勇, 森一富, 佐藤甲癸
電子情報通信学会論文誌 J75-C-I ( 10 ) 630 - 637 1992
Spatial distribution of plasma parameters in microwave plasma chemical vapor deposition
Tadashi Sakamoto, Isamu Kato
Jpn. J. Appl. Phys. 112/5 1992
Spatial Distribution of Space Potential in Chamber of Coaxial Line Type Microwave Plasma CVD
Tadashi Sakamoto, Isamu Kato
Jpn. J. Appl. Phys. XI-5/,217-220 1992
Probe Measurement in N2/SiH4 Microwave Plasma
Tadashi Sakamoto, Isamu Kato
Jpn. J. Appl. Phys. XI-4/,213-216 1992
Control of Ion Bombardment Energy in Coaxial Line Type Microwave Plasma CVD System
Masataka Kato, Isamu Kato
Jpn. J. Appl. Phys. V-3/,91-94 1992
Spatial distribution of plasma parameters in microwave plasma chemical vapor deposition
Tadashi Sakamoto, Isamu Kato
Jpn. J. Appl. Phys. 112/5 1992
Spatial Distribution of Space Potential in Chamber of Coaxial Line Type Microwave Plasma CVD
Tadashi Sakamoto, Isamu Kato
Jpn. J. Appl. Phys. XI-5/,217-220 1992
Probe Measurement in N2/SiH4 Microwave Plasma
Tadashi Sakamoto, Isamu Kato
Jpn. J. Appl. Phys. XI-4/,213-216 1992
Control of Ion Bombardment Energy in Coaxial Line Type Microwave Plasma CVD System
Masataka Kato, Isamu Kato
Jpn. J. Appl. Phys. V-3/,91-94 1992
マイクロ波放電を用いたプラズマ化学気相堆積法
加藤勇, 加藤聖隆, 阪本匡
電気学会 ED-91-60 141 - 150 1991
Effects of DC Bias on a-Si : H Films Fabricated by using Double Tubed Coaxial Line Type Microwave Plasma CVD System
Masataka Kato, Isamu Kato
Proceedings of the International Seminar on Reactive Plasmas(ICRP) DA-03/,193-196 1991
Deposition of Hydrogenated Amorphous Silicon Films Using a Microwave Plasma Chemical Vapor Deposition Method with DCBias
Masataka Kato, Isamu Kato
Jpn. J. Appl. Phys. 30/6,1245-1247 1991
RFバイアス印加マイクロ波プラズマCVD法によるSiN膜の低温作製
加藤聖隆, 加藤勇, 中島秀文
国際ハイブリッドマイクロエレクトロニクス協会 /,209-212 1991
同軸線路型マイクロ波プラズマCVDにおけるプラズマパラメータ
加藤勇, 臼居隆志, 阪本匡
電気学会 EP-91 11 - 20 1991
RPバイアス印加マイクロ波プラズマCVDによるSiN薄膜の作成
伊藤尚己, 加藤聖隆, 加藤勇
電子情報通信学会論文誌 J74-C-II ( 1 ) 21 - 25 1991
Effects of DC Bias on a-Si : H Films Fabricated by using Double Tubed Coaxial Line Type Microwave Plasma CVD System
Masataka Kato, Isamu Kato
Proceedings of the International Seminar on Reactive Plasmas(ICRP) DA-03/,193-196 1991
Deposition of Hydrogenated Amorphous Silicon Films Using a Microwave Plasma Chemical Vapor Deposition Method with DCBias
Masataka Kato, Isamu Kato
Jpn. J. Appl. Phys. 30/6,1245-1247 1991
Deposition Mechanism of a-Si : H Films Fabricated by Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition
Isamu Kato, Kazuhisa Hatanaka, Tetsuya Takumi
Bull. Sci. Eng. Res. Lab. Waseda Univ. 123,1-12 1990
Deposition Mechanism of a-Si : H Films Fabricated by Coaxial-Line-Type Microwave Plasma Chemical Vapor Deposition
Isamu Kato, Kazuhisa Hatanaka, Tetsuya Takumi
Bull. Sci. Eng. Res. Lab. Waseda Univ. 123,1-12 1990
New fabrication method of a star coupler by stacking polymer films
Isamu Kato, Masaaki Doi, Minoru Kawano, K.Sato
Appl. Optics 27/15 1988
a-Si:H膜装荷による高分子薄膜導波路形偏光素子
加藤勇, 原亮一, 杉山泰之
電子情報通信学会論文誌C J71-C/1 ( 1 ) 68 - 73 1988
New fabrication method of a star coupler by stacking polymer films
Isamu Kato, Masaaki Doi, Minoru Kawano, K.Sato
Appl. Optics 27/15 1988
Polymer thin film waveguide polarizar with a-Si : H clad
Isamu Kato, Yasuyuki Sugiyama, Kotaro Sugita
J.Appl.Phys J71-C/1 1987
Polymer thin film waveguide polarizar with a-Si : H clad
Isamu Kato, Yasuyuki Sugiyama, Kotaro Sugita
J.Appl.Phys J71-C/1 1987
同軸線路形マイクロ波プラズマCVD法によるプラズマ内外でのa-si:H膜の作成
加藤勇, 矢野元康
電子通信学会論文誌 J69-C ( 5 ) 662 - 668 1986
Fabrication of a-Si : H thin films in and out of plasma by coaxial line type microwave plasma CVD
Isamu Kato, Motoyasu Yano
J. Appl. Phys. J69-C/5 662 - 668 1986
Effect of Substrate Temperature on A-Si:H thin Films Fabricated by Double Tubed Coaxial Line Type Microwave Plasma CVD
Isamu Kato, Tetsuya Ueda, Kazuhisa Hatanaka
IEEJ Transactions on Fundamentals and Materials 106 ( 8 ) 391 - 397 1986
Fabrication of a-Si : H thin films in and out of plasma by coaxial line type microwave plasma CVD
Isamu Kato, Motoyasu Yano
J. Appl. Phys. J69-C/5 662 - 668 1986
同軸線路形マイクロ波プラズマCVD装置によるSiN膜の作成
加藤勇, 矢野元康, 幸山裕亮
電子通信学会論文誌 J68-C ( 10 ) 788 - 795 1985
Coaxial-line type microwave plasma CVD system to fabricate SiN films
Isamu Kato, Y.Sachiyama, Kazuto Noguchi
J. Appl. Phys. J68-C/10 788 - 795 1985
Coaxial-line type microwave plasma CVD system to fabricate SiN films
Isamu Kato, Y.Sachiyama, Kazuto Noguchi
J. Appl. Phys. J68-C/10 788 - 795 1985
光と電子のハイブリッド型集積回路の研究
アメリカ カリフォルニア大学
2013
